Invention Application
WO2012087364A1 SIMULTANEOUS WAFER BONDING AND INTERCONNECT JOINING 审中-公开
同时连接和互连

SIMULTANEOUS WAFER BONDING AND INTERCONNECT JOINING
Abstract:
Disclosed are a microelectronic assembly (300) of two elements (100, 200) and a method of forming same. A microelectronic element (100) includes a major surface (102), and a dielectric layer (120) and at least one bond pad (110) exposed at the major surface (102). The microelectronic element (100) may contain a plurality of active circuit elements. A first metal layer (130) is deposited overlying the at least one bond pad (110) and the dielectric layer (120). A second element (200) having a second metal layer (230) deposited thereon is provided, and the first metal layer (130) is joined with the second metal layer (230). The assembly (300) may be severed along dicing lanes (301) into individual units each including a chip.
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