Invention Application
WO2012094288A3 HIGH PURITY E-1-CHLORO-3,3,3-TRIFLUOROPROPENE AND METHODS OF MAKING THE SAME
审中-公开
高纯度E-1-氯代-3,3,3-三氟苯酚及其制备方法
- Patent Title: HIGH PURITY E-1-CHLORO-3,3,3-TRIFLUOROPROPENE AND METHODS OF MAKING THE SAME
- Patent Title (中): 高纯度E-1-氯代-3,3,3-三氟苯酚及其制备方法
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Application No.: PCT/US2012020035Application Date: 2012-01-03
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Publication No.: WO2012094288A3Publication Date: 2012-08-30
- Inventor: POKROVSKI KONSTANTIN A , SINGH RAJIV RATNA , SHANKLAND IAN , TUNG HSUEH SUNG
- Applicant: HONEYWELL INT INC , POKROVSKI KONSTANTIN A , SINGH RAJIV RATNA , SHANKLAND IAN , TUNG HSUEH SUNG
- Assignee: HONEYWELL INT INC,POKROVSKI KONSTANTIN A,SINGH RAJIV RATNA,SHANKLAND IAN,TUNG HSUEH SUNG
- Current Assignee: HONEYWELL INT INC,POKROVSKI KONSTANTIN A,SINGH RAJIV RATNA,SHANKLAND IAN,TUNG HSUEH SUNG
- Priority: US98402411 2011-01-04
- Main IPC: C07C17/20
- IPC: C07C17/20 ; C07B39/00 ; C07C19/10 ; C07C21/18
Abstract:
The present invention discloses high purity E-1-chloro-3,3,3-trifluoropropene (1233zd(E)) and methods to produce the same. More specifically, the present invention discloses the methods of making 1233zd(E) essentially free of toxic impurities (e.g. 2-chloro-3,3,3-trifluoropropene (1233xf), chlorotetrafluoro-propene (1224), and 3,3,3-trifluoropropyne). The present invention further provides methods for making high purity 1233zd(E) with concentration of 1233xf and 1224 at or below 200 parts per million (ppm) and 3,3,3-trifluoropropyne impurities at or below 20 ppm. Formation of 1233xf impurity can be avoided if pure 1,1,1,3,3-pentachloropropane is used as a starting material. It was also found that formation of 1233xf is avoided if a liquid phase manufacturing process is used.
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