Invention Application
- Patent Title: ELIMINATION OF SILICON RESIDUES FROM MEMS CAVITY FLOOR
- Patent Title (中): 从MEMS CAVITY地板消除硅残余物
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Application No.: PCT/US2012049497Application Date: 2012-08-03
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Publication No.: WO2013020039A3Publication Date: 2013-03-21
- Inventor: TROY BRIAN I , RENAULT MICKAEL , MAGUIRE THOMAS L , LACEY JOSEPH DAMIAN GORDON , BOBEY JAMES F
- Applicant: CAVENDISH KINETICS INC , TROY BRIAN I , RENAULT MICKAEL , MAGUIRE THOMAS L , LACEY JOSEPH DAMIAN GORDON , BOBEY JAMES F
- Assignee: CAVENDISH KINETICS INC,TROY BRIAN I,RENAULT MICKAEL,MAGUIRE THOMAS L,LACEY JOSEPH DAMIAN GORDON,BOBEY JAMES F
- Current Assignee: CAVENDISH KINETICS INC,TROY BRIAN I,RENAULT MICKAEL,MAGUIRE THOMAS L,LACEY JOSEPH DAMIAN GORDON,BOBEY JAMES F
- Priority: US201161514823 2011-08-03
- Main IPC: B81C1/00
- IPC: B81C1/00 ; H01H1/00
Abstract:
The present invention generally relates to a MEMS device in which silicon residues from the adhesion promoter material are reduced or even eliminated from the cavity floor. The adhesion promoter is typically used to adhere sacrificial material to material above the substrate. The adhesion promoter is then removed along with the sacrificial material. However, the adhesion promoter leaves silicon based residues within the cavity upon removal. The inventors have discovered that the adhesion promoter can be removed from the cavity area prior to depositing the sacrificial material. The adhesion promoter which remains over the remainder of the substrate is sufficient to ad¬ here the sacrificial material to the substrate without fear of the sacrificial material delaminating. Because no adhesion promoter is used in the cavity area of the device, no silicon residues will be present within the cavity after the switching element of the MEMS device is freed.
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