Invention Application
WO2013020039A3 ELIMINATION OF SILICON RESIDUES FROM MEMS CAVITY FLOOR 审中-公开
从MEMS CAVITY地板消除硅残余物

ELIMINATION OF SILICON RESIDUES FROM MEMS CAVITY FLOOR
Abstract:
The present invention generally relates to a MEMS device in which silicon residues from the adhesion promoter material are reduced or even eliminated from the cavity floor. The adhesion promoter is typically used to adhere sacrificial material to material above the substrate. The adhesion promoter is then removed along with the sacrificial material. However, the adhesion promoter leaves silicon based residues within the cavity upon removal. The inventors have discovered that the adhesion promoter can be removed from the cavity area prior to depositing the sacrificial material. The adhesion promoter which remains over the remainder of the substrate is sufficient to ad¬ here the sacrificial material to the substrate without fear of the sacrificial material delaminating. Because no adhesion promoter is used in the cavity area of the device, no silicon residues will be present within the cavity after the switching element of the MEMS device is freed.
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