Invention Application
- Patent Title: LIGHT MODULATOR AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
- Patent Title (中): 微电子投影曝光装置的光调制器和照明系统
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Application No.: PCT/EP2011/005737Application Date: 2011-11-15
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Publication No.: WO2013071940A1Publication Date: 2013-05-23
- Inventor: WERBER, Armin , WALDIS, Severin , BACH, Florian
- Applicant: CARL ZEISS SMT GMBH , WERBER, Armin , WALDIS, Severin , BACH, Florian
- Applicant Address: Rudolf-Eber-Str. 2 73447 Oberkochen DE
- Assignee: CARL ZEISS SMT GMBH,WERBER, Armin,WALDIS, Severin,BACH, Florian
- Current Assignee: CARL ZEISS SMT GMBH,WERBER, Armin,WALDIS, Severin,BACH, Florian
- Current Assignee Address: Rudolf-Eber-Str. 2 73447 Oberkochen DE
- Agency: SCHWANHÄUSSER, Gernot et al.
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B26/08
Abstract:
An illumination system of a microlithographic projection exposure apparatus comprises a light modulator (38) which includes a modulator substrate (70) and an array of mirrors (42a, 42b, 42c) that are supported by the modulator substrate (70). At least some adjacent mirrors partly overlap. The light modulator further comprises a plurality of actuators (86, 88) that are supported by the modulator substrate (70) and are configured to tilt the mirrors (42a, 42b, 42c) individually.
Information query
IPC分类:
