Invention Application
- Patent Title: ON-AXIS FOCUS SENSOR AND METHOD
- Patent Title (中): 轴对焦传感器和方法
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Application No.: PCT/US2012/071030Application Date: 2012-12-20
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Publication No.: WO2013096660A1Publication Date: 2013-06-27
- Inventor: OHREN, Dennis L. , VOGES, Christopher J. , ROTERING, Andrew E.
- Applicant: RUDOLPH TECHNOLOGIES, INC.
- Applicant Address: One Rudolph Road Flanders, New Jersey 07836 US
- Assignee: RUDOLPH TECHNOLOGIES, INC.
- Current Assignee: RUDOLPH TECHNOLOGIES, INC.
- Current Assignee Address: One Rudolph Road Flanders, New Jersey 07836 US
- Agency: FRONEK, Todd R. et al.
- Priority: US61/580,028 20111223
- Main IPC: G01B11/00
- IPC: G01B11/00 ; G01N21/88 ; G01C5/00
Abstract:
A focus height sensor in an optical system for inspection of semiconductor devices includes a sensor beam source that emits a beam of electromagnetic radiation. A reflector receives the beam of electromagnetic radiation from the sensor beam source and directs the beam toward a surface of a semiconductor device positioned within a field of view of the optical system. The reflector is positioned to receive at least a portion of the beam back from the surface of the semiconductor device to direct the returned beam to a sensor. The sensor receives the returned beam and outputs a signal correlating to a position of the surface within the field of view along an optical axis of the optical system.
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