Invention Application
WO2014043557A1 DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTION IMAGING WITH BOTH HIGH AND LOW BEAM CURRENTS
审中-公开
双镜头电子束装置和用于高分辨率成像和高光束和低光束电流的方法
- Patent Title: DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTION IMAGING WITH BOTH HIGH AND LOW BEAM CURRENTS
- Patent Title (中): 双镜头电子束装置和用于高分辨率成像和高光束和低光束电流的方法
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Application No.: PCT/US2013/059788Application Date: 2013-09-13
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Publication No.: WO2014043557A1Publication Date: 2014-03-20
- Inventor: JIANG, Xinrong , HAN, Liqun
- Applicant: KLA-TENCOR CORPORATION
- Applicant Address: KLA-Tencor Corporation Legal Department One Technology Drive Milpitas, California 95035 US
- Assignee: KLA-TENCOR CORPORATION
- Current Assignee: KLA-TENCOR CORPORATION
- Current Assignee Address: KLA-Tencor Corporation Legal Department One Technology Drive Milpitas, California 95035 US
- Agency: MCANDREWS, Kevin
- Priority: US13/618,760 20120914
- Main IPC: H01J37/26
- IPC: H01J37/26
Abstract:
One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.
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