Invention Application
WO2015112328A1 HIGH SPEED EPI SYSTEM AND CHAMBER CONCEPTS 审中-公开
高速EPI系统和机箱概念

HIGH SPEED EPI SYSTEM AND CHAMBER CONCEPTS
Abstract:
Embodiments described herein generally relate to a batch processing chamber. The batch processing chamber includes a lid, a chamber wall and a bottom that define a processing region. A cassette including a stack of susceptors for supporting substrates is disposed in the processing region. The edge of the cassette is coupled to a plurality of shafts and the shafts are coupled to a rotor. During operation, the rotor rotates the cassette to improve deposition uniformity. A heating element is disposed on the chamber wall and a plurality of gas inlets is disposed through the heating element on the chamber wall. Each gas inlet is substantially perpendicular to the chamber wall.
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