Invention Application
WO2015176750A1 DEPOSITION APPARATUS FOR DEPOSITION OF A MATERIAL ON A SUBSTRATE AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE
审中-公开
用于沉积基材上的材料的沉积装置和在基材上沉积材料的方法
- Patent Title: DEPOSITION APPARATUS FOR DEPOSITION OF A MATERIAL ON A SUBSTRATE AND METHOD FOR DEPOSITING A MATERIAL ON A SUBSTRATE
- Patent Title (中): 用于沉积基材上的材料的沉积装置和在基材上沉积材料的方法
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Application No.: PCT/EP2014/060359Application Date: 2014-05-20
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Publication No.: WO2015176750A1Publication Date: 2015-11-26
- Inventor: ZILBAUER, Thomas, Werner , HELLMICH, Anke , HINTERSCHUSTER, Reiner , MÜHLFELD, Uwe , STOCK, Bernhard , WOLF, Hans, Georg , BENDER, Marcus
- Applicant: APPLIED MATERIALS, INC. , ZILBAUER, Thomas, Werner , HELLMICH, Anke , HINTERSCHUSTER, Reiner , MÜHLFELD, Uwe , STOCK, Bernhard , WOLF, Hans, Georg , BENDER, Marcus
- Applicant Address: 3050 Bowers Avenue Santa Clara, CA 95054 US
- Assignee: APPLIED MATERIALS, INC.,ZILBAUER, Thomas, Werner,HELLMICH, Anke,HINTERSCHUSTER, Reiner,MÜHLFELD, Uwe,STOCK, Bernhard,WOLF, Hans, Georg,BENDER, Marcus
- Current Assignee: APPLIED MATERIALS, INC.,ZILBAUER, Thomas, Werner,HELLMICH, Anke,HINTERSCHUSTER, Reiner,MÜHLFELD, Uwe,STOCK, Bernhard,WOLF, Hans, Georg,BENDER, Marcus
- Current Assignee Address: 3050 Bowers Avenue Santa Clara, CA 95054 US
- Agency: ZIMMERMANN & PARTNER
- Main IPC: C23C14/56
- IPC: C23C14/56 ; C23C16/44 ; C23C16/54
Abstract:
A deposition apparatus (300) for deposition of a material on a substrate is provided. The deposition apparatus (300) includes a first processing chamber (310) and a second processing chamber (320); at least one first deposition source (311) in the first processing chamber (310) and at least one second deposition source (321) in the second processing chamber (320); and at least one first shield device (350). The at least one first shield device (350) is configured to be moveable at least between a first position and a second position, wherein the at least one first shield device (350) is configured to shield the at least one first deposition source (311) when the at least one first shield device (350) is in the first position. The at least one first shield device (350) is configured to be moveable at least between the first processing chamber (310) and the second processing chamber (320).
Information query
IPC分类:
