Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND METHOD
- Patent Title (中): LITHOGRAPHIC设备和方法
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Application No.: PCT/EP2016/069879Application Date: 2016-08-23
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Publication No.: WO2017050506A1Publication Date: 2017-03-30
- Inventor: EVERTS, Frank , OP 'T ROOT, Wilhelmus, Patrick, Elisabeth, Maria , GODFRIED, Herman, Philip , THORNES, Joshua, Jon , O'BRIEN, Kevin, Michael , SAANEN, Leon, Pieter, Paul , AGGARWAL, Tanuj
- Applicant: ASML NETHERLANDS B.V. , CYMER INC.
- Applicant Address: P.O. Box 324 5500 AH Veldhoven NL
- Assignee: ASML NETHERLANDS B.V.,CYMER INC.
- Current Assignee: ASML NETHERLANDS B.V.,CYMER INC.
- Current Assignee Address: P.O. Box 324 5500 AH Veldhoven NL
- Agency: KETTING, Alfred
- Priority: US62/222,610 20150923
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.
Information query
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