LITHOGRAPHIC APPARATUS AND METHOD
    1.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
    LITHOGRAPHIC设备和方法

    公开(公告)号:WO2017050506A1

    公开(公告)日:2017-03-30

    申请号:PCT/EP2016/069879

    申请日:2016-08-23

    CPC classification number: G03F7/70558 G03F7/70066 G03F7/70525

    Abstract: A method of controlling output of a radiation source, the method including: periodically monitoring an output energy of the radiation source; determining a difference between a reference energy signal and the monitored output energy; determining a feedback value; determining a desired output energy of the radiation source for a subsequent time period; and controlling an input parameter of the radiation source in dependence on the determined desired output energy during the subsequent time period. If the magnitude of the determined difference between the monitored output energy of the radiation source and the reference energy signal exceeds a threshold value: the determined difference does not contribute to the feedback value; and the determined difference is spread over the subsequent time period according to a reference energy signal adjustment profile and the reference energy signal adjustment profile is added to the reference energy signal for the subsequent time period.

    Abstract translation: 一种控制辐射源输出的方法,所述方法包括:周期性地监测辐射源的输出能量; 确定参考能量信号和所监视的输出能量之间的差异; 确定反馈值; 在随后的时间段内确定辐射源的期望输出能量; 以及根据所确定的期望的输出能量在随后的时间段期间控制辐射源的输入参数。 如果所监测的辐射源的输出能量与参考能量信号之间所确定的差值的大小超过阈值:所确定的差值对反馈值无贡献; 并且根据参考能量信号调整曲线将确定的差分扩展到随后的时间段,并且将参考能量信号调整曲线添加到随后时间段的参考能量信号。

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