Invention Application
- Patent Title: BLOCK COPOLYMERS FOR SUB-10 NM PATTERNING
- Patent Title (中): 用于亚10 NM图案化的嵌段共聚物
-
Application No.: PCT/US2017/018944Application Date: 2017-02-22
-
Publication No.: WO2017147185A1Publication Date: 2017-08-31
- Inventor: WILLSON, Carlton, Grant , BLACHUT, Gregory , MAHER, Michael , ASANO, Yusuke , ELLISON, Christopher, John
- Applicant: BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM
- Applicant Address: 201 W. 7th Street Austin, TX 78701 US
- Assignee: BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM
- Current Assignee: BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM
- Current Assignee Address: 201 W. 7th Street Austin, TX 78701 US
- Agency: HOWERTON, Thomas, C. et al.
- Priority: US62/298,628 20160223
- Main IPC: C08F299/02
- IPC: C08F299/02 ; C08F224/00 ; C08F230/08 ; B32B27/28
Abstract:
The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.
Information query
