公开(公告)号：WO2013119832A1

公开(公告)日：2013-08-15

申请号：PCT/US2013/025174

申请日：2013-02-07

Applicant: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM

Inventor： WILLSON, Carlton, Grant ,  ELLISON, Christopher, John ,  SESHIMO, Takehiro ,  CUSHEN, Julia ,  BATES, Christopher, M. ,  DEAN, Leon ,  SANTOS, Logan, J. ,  RAUSCH, Erica, L.

IPC: G03F7/00 ,  B81C1/00

CPC classification number: G03F1/50 ,  B05D1/005 ,  B05D5/00 ,  B05D7/52 ,  B05D7/56 ,  B05D2252/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C09D137/00 ,  C09D167/00 ,  G03F7/0002 ,  Y10T428/24802 ,  Y10T428/31663 ,  Y10T428/31855

Abstract: The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

Abstract translation: 本发明涉及使用可以旋涂在嵌段共聚物薄膜上并用于控制顶部涂层 - 嵌段共聚物界面的界面能的无规共聚物顶涂层。 顶涂层可溶于弱碱水溶液，一旦沉积在嵌段共聚物薄膜上就可以改变表面能。 使用自组装嵌段共聚物来生产先进的平版印刷图案依赖于它们在薄膜中的取向控制。 顶涂层可能允许嵌段共聚物的容易取向控制，否则这将是相当具有挑战性的。

公开(公告)号：WO2013119820A1

公开(公告)日：2013-08-15

申请号：PCT/US2013/025160

申请日：2013-02-07

Applicant: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM

Inventor： ELLISON, Christopher, John ,  WILLSON, Carlton, Grant ,  CUSHEN, Julia ,  BATES, Christopher, M.

IPC: C08G63/695 ,  G03F7/00

CPC classification number: C09D167/00 ,  B05C21/005 ,  B05D1/005 ,  B05D3/00 ,  B05D5/00 ,  B82Y10/00 ,  B82Y40/00 ,  C08F8/02 ,  C08F112/14 ,  C08F2810/40 ,  C08G63/6952 ,  G03F7/0002 ,  Y10T428/24851 ,  Y10T428/31504

Abstract: The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other polymer is a polylactide. In one embodiment, the block copolymer is synthesized by a combination of anionic and ring opening polymerization reactions. In one embodiment, the purpose of this block copolymer is to form nanoporous materials that can be used as etch masks in lithographic patterning.

Abstract translation: 本发明包括以非常低的分子量自组装形成非常小的特征的二嵌段共聚物体系。 在一个实施方案中，嵌段共聚物中的一种聚合物含有硅，另一种聚合物是聚丙交酯。 在一个实施方案中，嵌段共聚物通过阴离子和开环聚合反应的组合合成。 在一个实施方案中，该嵌段共聚物的目的是形成可用作光刻图案化中的蚀刻掩模的纳米多孔材料。

公开(公告)号：WO2017147185A1

公开(公告)日：2017-08-31

申请号：PCT/US2017/018944

申请日：2017-02-22

Applicant: BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM

Inventor： WILLSON, Carlton, Grant ,  BLACHUT, Gregory ,  MAHER, Michael ,  ASANO, Yusuke ,  ELLISON, Christopher, John

IPC: C08F299/02 ,  C08F224/00 ,  C08F230/08 ,  B32B27/28

CPC classification number: C08F297/00 ,  B05D3/108 ,  B05D7/26 ,  B05D7/542 ,  B81C2201/0149 ,  B82Y40/00 ,  C09D153/00 ,  G03F7/0002 ,  H01L21/0271

Abstract: The present invention relates to a method for the synthesis and utilization of block copolymer can that form sub-10 nm lamella nanostructures. Such methods have many uses including multiple applications in the semiconductor industry including production of templates for nanoimprint lithography.

Abstract translation: 本发明涉及用于合成和利用形成小于10nm的层状纳米结构的嵌段共聚物的方法。 这种方法有许多用途，包括半导体工业中的多种应用，包括用于纳米压印光刻的模板的生产。

公开(公告)号：WO2013119811A1

公开(公告)日：2013-08-15

申请号：PCT/US2013/025145

申请日：2013-02-07

Applicant: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM

Inventor： WILLSON, Carlton, Grant ,  DURAND, William, J. ,  ELLISON, Christopher, John ,  BATES, Christopher, M. ,  SESHIMO, Takehiro ,  CUSHEN, Julia ,  SANTOS, Logan, J. ,  DEAN, Leon ,  RAUSCH, Erica, L.

IPC: G03F7/00 ,  B81C1/00

CPC classification number: C23C16/44 ,  B29C43/32 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/788 ,  Y10S977/809 ,  Y10S977/811 ,  Y10S977/839 ,  Y10S977/888 ,  Y10S977/89 ,  Y10S977/891 ,  Y10T428/24802 ,  Y10T428/31504

Abstract: The present invention uses vacuum deposited thin films of material to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.

Abstract translation: 本发明使用真空沉积的材料薄膜来产生与下面的嵌段共聚物膜的不同区域非优先相互作用的界面。 非优选界面防止形成润湿层并影响嵌段共聚物中结构域的取向。 沉积的聚合物的目的是在嵌段共聚物膜中产生可用作光刻图案的纳米结构特征。

公开(公告)号：WO2012177839A1

公开(公告)日：2012-12-27

申请号：PCT/US2012/043491

申请日：2012-06-21

Applicant: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM ,  ELLISON, Christopher, John ,  CUSHEN, Julia ,  OTSUKA, Issei ,  WILLSON, C., Grant ,  BATES, Christopher, M. ,  EASLEY, Jeffery, Alan ,  BORSALI, Redouane ,  FORT, Sebastein ,  HALILA, Sami

Inventor： ELLISON, Christopher, John ,  CUSHEN, Julia ,  OTSUKA, Issei ,  WILLSON, C., Grant ,  BATES, Christopher, M. ,  EASLEY, Jeffery, Alan ,  BORSALI, Redouane ,  FORT, Sebastein ,  HALILA, Sami

IPC: C08F293/00 ,  C08G73/06 ,  G03F7/00 ,  C08G81/02 ,  C07H3/06 ,  B82Y40/00

CPC classification number: C08F293/005 ,  B82Y10/00 ,  B82Y40/00 ,  C07H23/00 ,  C08B37/0006 ,  C08B37/0012 ,  C08G81/024 ,  G03F7/0002 ,  Y10T428/24355

Abstract: The present invention discloses diblock copolymer systems that self-assemble to produce very small structures. These co-polymers consist of one block that contains silicon and another block comprised of an oligosaccharide that are coupled by azide-alkyne cycloaddition.

Abstract translation: 本发明公开了自组装以产生非常小的结构的二嵌段共聚物体系。 这些共聚物由含有硅的一个嵌段和由通过叠氮炔 - 环加成偶联的寡糖组成的另一嵌段组成。