Invention Application
- Patent Title: SELF-STOPPING POLISHING COMPOSITION AND METHOD FOR BULK OXIDE PLANARIZATION
-
Application No.: PCT/US2018/024067Application Date: 2018-03-23
-
Publication No.: WO2018194792A1Publication Date: 2018-10-25
- Inventor: HAINS, Alexander W. , CHANG, Juyeon , LI, Tina C. , LAM, Viet , CUI, Ji , BROSNAN, Sarah , NAM, Chul Woo
- Applicant: CABOT MICROELECTRONICS CORPORATION
- Applicant Address: 870 North Commons Drive Aurora, Illinois 60504 US
- Assignee: CABOT MICROELECTRONICS CORPORATION
- Current Assignee: CABOT MICROELECTRONICS CORPORATION
- Current Assignee Address: 870 North Commons Drive Aurora, Illinois 60504 US
- Agency: OMHOLT, Thomas
- Priority: US62/486,219 20170417
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C09G1/04 ; C09K3/14 ; H01L21/306
Abstract:
The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
Information query
