发明申请
- 专利标题： APPARATUS FOR PROCESSING A SUBSTRATE, PROCESSING SYSTEM AND METHOD THEREFOR
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申请号： PCT/EP2017/061728申请日： 2017-05-16
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公开(公告)号： WO2018210408A1公开(公告)日： 2018-11-22
- 发明人: WHITE, John M. , CAN, Linh , LINDENBERG, Ralph
- 申请人： APPLIED MATERIALS, INC. , WHITE, John M. , CAN, Linh , LINDENBERG, Ralph
- 申请人地址： 3050 Bowers Avenue Santa Clara, California 95054 US
- 专利权人： APPLIED MATERIALS, INC.,WHITE, John M.,CAN, Linh,LINDENBERG, Ralph
- 当前专利权人： APPLIED MATERIALS, INC.,WHITE, John M.,CAN, Linh,LINDENBERG, Ralph
- 当前专利权人地址： 3050 Bowers Avenue Santa Clara, California 95054 US
- 代理机构： ZIMMERMANN & PARTNER PATENTANWÄLTE MBB
- 主分类号： C23C14/56
- IPC分类号： C23C14/56 ; C23C14/50 ; C23C16/458 ; C23C16/54 ; H01L21/677
摘要：
An apparatus (100) for processing a substrate is described. The apparatus includes a first vacuum processing arrangement (101), a second vacuum processing arrangement (102), and a support structure (103) arranged in an atmospheric space (108) between the first vacuum processing arrangement (101) and the second vacuum processing arrangement (102).
IPC分类:
