Invention Application
- Patent Title: MAGNETIC TUNNEL JUNCTION STRUCTURES AND METHODS OF MANUFACTURE THEREOF
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Application No.: PCT/US2019/026079Application Date: 2019-04-05
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Publication No.: WO2019217014A1Publication Date: 2019-11-14
- Inventor: XUE, Lin , CHING, Chi Hong , WANG, Rongjun , PAKALA, Mahendra
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Agency: PATTERSON, B. Todd et al.
- Priority: US62/668,559 20180508; US16/351,850 20190313
- Main IPC: H01L43/10
- IPC: H01L43/10 ; H01L43/02
Abstract:
Embodiments of magnetic tunnel junction (MTJ) structures discussed herein employ seed layers of one or more layer of chromium (Cr), NiCr, NiFeCr, RuCr, IrCr, or CoCr, or combinations thereof. These seed layers are used in combination with one or more pinning layers, a first pinning layer in contact with the seed layer can contain a single layer of cobalt, or can contain cobalt in combination with bilayers of cobalt and platinum (Pt), iridium (Ir), nickel (Ni), or palladium (Pd), The second pinning layer can be the same composition and configuration as the first, or can be of a different composition or configuration. The MTJ stacks discussed herein maintain desirable magnetic properties subsequent to high temperature annealing.
Information query
IPC分类: