Invention Application
- Patent Title: METHODS AND APPARATUS FOR ALD PROCESSES
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Application No.: PCT/US2019/042457Application Date: 2019-07-18
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Publication No.: WO2020028062A1Publication Date: 2020-02-06
- Inventor: KHO, Jeffrey A. , KAO, Chien-Teh , ZHOU, Jianhua
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: 3050 Bowers Avenue Santa Clara, California 95054 US
- Agency: PATTERSON, B. Todd et al.
- Priority: US62/712,793 20180731
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L51/00 ; H01L51/56 ; H01L21/67 ; C23C16/455
Abstract:
The present disclosure relates to methods and apparatus for an atomic layer deposition (ALD) chamber. In one embodiment, a lid assembly is provided that includes a multi-channel showerhead having a plurality of first gas channels and a plurality of second gas channels that are fluidly isolated from each of the first gas channels, and a flow guide coupled to opposing sides of the multi-channel showerhead, each of the flow guides being fluidly coupled to the plurality of second gas channels
Information query
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