公开(公告)号：WO2020028062A1

公开(公告)日：2020-02-06

申请号：PCT/US2019/042457

申请日：2019-07-18

Applicant: APPLIED MATERIALS, INC.

Inventor： KHO, Jeffrey A. ,  KAO, Chien-Teh ,  ZHOU, Jianhua

IPC: H01L21/02 ,  H01L51/00 ,  H01L51/56 ,  H01L21/67 ,  C23C16/455

Abstract: The present disclosure relates to methods and apparatus for an atomic layer deposition (ALD) chamber. In one embodiment, a lid assembly is provided that includes a multi-channel showerhead having a plurality of first gas channels and a plurality of second gas channels that are fluidly isolated from each of the first gas channels, and a flow guide coupled to opposing sides of the multi-channel showerhead, each of the flow guides being fluidly coupled to the plurality of second gas channels

公开(公告)号：WO2013154536A1

公开(公告)日：2013-10-17

申请号：PCT/US2012/032879

申请日：2012-04-10

Applicant: APPLIED MATERIALS, INC. ,  KURITA, Shinichi ,  INAGAWA, Makoto ,  KHO, Jeffrey A. ,  TINER, Robin L. ,  ANWAR, Suhail

Inventor： KURITA, Shinichi ,  INAGAWA, Makoto ,  KHO, Jeffrey A. ,  TINER, Robin L. ,  ANWAR, Suhail

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/02

CPC classification number: H01L21/67196

Abstract: A serial cluster tool system is provided. The system includes a first cluster tool having a first plurality of processing chambers and at least one first peripheral chamber, a second cluster tool having a second plurality of processing chambers and at least one second peripheral chamber, and an interchamber adapter device coupling the at least one first peripheral chamber to the at least one second peripheral chamber, the interchamber adapter device comprising a vacuum-proof flexible section coupled between sealing faces of the first chamber and the second chamber.

Abstract translation: 提供串行集群工具系统。 该系统包括具有第一多个处理室和至少一个第一周边室的第一集群工具，具有第二多个处理室和至少一个第二周边室的第二集群工具以及至少联接至少 一个至少一个第二周边室的第一周边室，所述车间适配器装置包括联接在所述第一室和第二室的密封面之间的防真空柔性部分。

公开(公告)号：WO2023043643A2

公开(公告)日：2023-03-23

申请号：PCT/US2022/042651

申请日：2022-09-06

Applicant: APPLIED MATERIALS, INC.

Inventor： SIRY, Milan ,  LIANG, Michael ,  KHO, Jeffrey A. ,  HUH, Kwang Soo

Abstract: Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas. The gas flow inlet guide having a flow guide bottom plate having an opening. A top plate is disposed over the flow guide bottom plate and a plasma blocker is disposed over the opening. The plasma blocker includes one or more apertures sized based one or more of a plasma density, an electron temperature, an ion temperature, or a characteristic of a process gas.

公开(公告)号：WO2023277920A1

公开(公告)日：2023-01-05

申请号：PCT/US2021/040118

申请日：2021-07-01

Applicant: APPLIED MATERIALS, INC.

Inventor： SUN, Guangwei ,  KHO, Jeffrey A. ,  ZHAO, Lai ,  SUN, Zhelin ,  BEHDJAT, Mehran ,  XU, Ming ,  CHOI, Kenric T. ,  HUH, Kwang Soo

IPC: C23C16/448 ,  H01J37/32 ,  C23C14/48

Abstract: The present disclosure is directed to a precursor delivery system is provided having a vaporizer and a reservoir. The reservoir includes an upstream end in fluid communication with the vaporizer. A reservoir valve is in fluid communication with a downstream end of the reservoir and a final valve is disposed downstream of the reservoir valve. A buffer zone is defined between the reservoir valve and the final valve. A first gas inlet is coupled to the buffer zone. The first gas inlet is coupled to a buffer valve.

公开(公告)号：WO2020013972A1

公开(公告)日：2020-01-16

申请号：PCT/US2019/038267

申请日：2019-06-20

Applicant: APPLIED MATERIALS, INC.

Inventor： KAO, Chien-Teh ,  KHO, Jeffrey A. ,  RUI, Xiangxin ,  ZHOU, Jianhua ,  KURITA, Shinichi ,  SHAO, Shouqian ,  SUN, Guangwei

IPC: C23C16/455

Abstract: Embodiments described herein provide a chamber having a gas flow inlet guide to uniformly deliver process gas and a gas flow outlet guide to effectively purge process gasses and reduce purge time. The chamber includes a chamber body having a process gas inlet and a process gas outlet, a lid assembly, a process gas inlet and a process gas outlet configured to be in fluid communication with a processing region in the chamber, a gas flow inlet guide disposed in the process gas inlet, and a gas flow outlet guide disposed in the process gas outlet. The gas flow inlet guide includes a flow modulator and at least two first inlet guide channels having first inlet guide channel areas that are different. The gas flow outlet guide includes at least two first outlet guide channels having first outlet guide channel areas that are different.

公开(公告)号：WO2010091205A2

公开(公告)日：2010-08-12

申请号：PCT/US2010/023236

申请日：2010-02-04

Applicant: APPLIED MATERIALS, INC. ,  CHOI, Soo Young ,  TINER, Robin L. ,  KURITA, Shinichi ,  WHITE, John M. ,  SORENSEN, Carl A. ,  KHO, Jeffrey A. ,  ANWAR, Suhail ,  FURUTA, Gaku ,  INAGAWA, Makoto

Inventor： CHOI, Soo Young ,  TINER, Robin L. ,  KURITA, Shinichi ,  WHITE, John M. ,  SORENSEN, Carl A. ,  KHO, Jeffrey A. ,  ANWAR, Suhail ,  FURUTA, Gaku ,  INAGAWA, Makoto

IPC: H05H1/34 ,  H01L21/205

CPC classification number: C23C16/5096 ,  C23C16/4585 ,  H01J37/32091 ,  H01J37/32174 ,  H01J37/32568 ,  H01L21/67069

Abstract: A method and apparatus for providing an electrically symmetrical ground or return path for electrical current between two electrodes is described. The apparatus includes at least on radio frequency (RF) device coupled to one of the electrodes and between a sidewall and/or a bottom of a processing chamber. The method includes moving one electrode relative to another and realizing a ground return path based on the position of the displaced electrode using one or both of a RF device coupled to a sidewall and the electrode, a RF device coupled to a bottom of the chamber and the electrode, or a combination thereof.

Abstract translation: 描述了用于为两个电极之间的电流提供电对称接地或返回路径的方法和设备。 该装置包括至少一个射频（RF）装置，该射频（RF）装置耦合到电极中的一个并且位于处理室的侧壁和/或底部之间。 该方法包括使用一个电极相对于另一个电极移动，并且使用耦合到侧壁和电极的RF装置，耦合到腔室底部的RF装置以及耦合到侧壁和电极的RF装置中的一个或两个，基于位移电极的位置实现接地返回路径， 电极或其组合。