The present invention provides: an actinic-ray-sensitive or radiation-sensitive resin composition comprising a resin having a repeating unit represented by general formula (P1) and a compound which, upon irradiation with actinic rays or radiation, generates an acid having a pKa of -1.40 or greater; a resist film obtained from the composition; a method for forming a pattern; and a method for producing an electronic device. M^p represents a single bond or a divalent linking group.　L^p represents a divalent linking group.　X^p represents O, S, or NR^N1, where R^N1 represents a monovalent organic group.　R^p represents a monovalent organic group.