Invention Application
- Patent Title: METHOD FOR OVERLAY METROLOGY AND APPARATUS THEREOF
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Application No.: PCT/EP2019/086222Application Date: 2019-12-19
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Publication No.: WO2020141085A1Publication Date: 2020-07-09
- Inventor: MATHIJSSEN, Simon, Gijsbert, Josephus , DEN BOEF, Arie, Jeffrey , BHATTACHARYYA, Kaustuve
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: P.O. Box 324 5500 AH Veldhoven NL
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: P.O. Box 324 5500 AH Veldhoven NL
- Agency: BROEKEN, Petrus Henricus Johannes
- Priority: US62/787,191 20181231
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method includes receiving an image formed in a metrology apparatus wherein the image comprises at least the resulting effect of at least two diffraction orders, and processing the image wherein the processing comprises at least a filtering step, for example a Fourier filter. The process of applying a filter may be obtained also by placing an aperture in the detection branch of the metrology apparatus.
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