Invention Application
- Patent Title: WAVEFRONT SENSOR AND ASSOCIATED METROLOGY APPARATUS
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Application No.: PCT/EP2019/086296Application Date: 2019-12-19
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Publication No.: WO2020151891A1Publication Date: 2020-07-30
- Inventor: VAN DER POST, Sietse, Thijmen , VAN VOORST, Peter, Danny
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: P.O. Box 324 5500 AH Veldhoven NL
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: P.O. Box 324 5500 AH Veldhoven NL
- Agency: WILLEKENS, Jeroen Pieter Frank
- Priority: EP19153671.3 20190125
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01J9/00 ; H05G2/00 ; G02B3/00 ; G02B5/18
Abstract:
Disclosed is a wavefront sensor for measuring a tilt of a wavefront at an array of locations across a beam of radiation, wherein said wavefront sensor comprises a film, for example of Zirconium, having an indent array comprising an indent at each of said array of locations, such that each indent of the indent array is operable to perform focusing of said radiation. Also disclosed is a radiation source and inspection apparatus comprising such a wavefront sensor.
Information query
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