公开(公告)号：WO2020173640A1

公开(公告)日：2020-09-03

申请号：PCT/EP2020/051986

申请日：2020-01-28

Applicant: ASML NETHERLANDS B.V.

Inventor： ROOBOL, Sander, Bas ,  VAN DER POST, Sietse, Thijmen

IPC: H01L23/00 ,  H01L25/065 ,  H01L33/10 ,  G03F7/20 ,  B29C65/48 ,  B32B17/06 ,  B32B38/18

Abstract: Disclosed is a method of manufacturing a reflector. The method comprises polishing (520) at least the uppermost surface of the uppermost substantially flat substrate of a plurality of substantially flat substrates, deforming (530) each substantially flat substrate into the desired shape, and bonding (540) the deformed substrates together to form said reflector. In an embodiment, the deforming and bonding is performed together using a mold.

公开(公告)号：WO2020151891A1

公开(公告)日：2020-07-30

申请号：PCT/EP2019/086296

申请日：2019-12-19

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER POST, Sietse, Thijmen ,  VAN VOORST, Peter, Danny

IPC: G03F7/20 ,  G01J9/00 ,  H05G2/00 ,  G02B3/00 ,  G02B5/18

Abstract: Disclosed is a wavefront sensor for measuring a tilt of a wavefront at an array of locations across a beam of radiation, wherein said wavefront sensor comprises a film, for example of Zirconium, having an indent array comprising an indent at each of said array of locations, such that each indent of the indent array is operable to perform focusing of said radiation. Also disclosed is a radiation source and inspection apparatus comprising such a wavefront sensor.

公开(公告)号：WO2019233738A1

公开(公告)日：2019-12-12

申请号：PCT/EP2019/062767

申请日：2019-05-17

Applicant: ASML NETHERLANDS B.V.

Inventor： TRIPODI, Lorenzo ,  WARNAAR, Patrick ,  GRZELA, Grzegorz ,  HAJIAHMADI, Mohammadreza ,  FARHADZADEH, Farzad ,  TINNEMANS, Patricius, Aloysius Jacobus ,  MIDDLEBROOKS, Scott, Anderson ,  KOOPMAN, Adrianus, Cornelis, Matheus ,  STAALS, Frank ,  PETERSON, Brennan ,  VAN OOSTEN, Anton, Bernhard

IPC: G03F7/20

Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.

公开(公告)号：WO2019048147A1

公开(公告)日：2019-03-14

申请号：PCT/EP2018/071103

申请日：2018-08-03

Applicant: ASML NETHERLANDS B.V.

Inventor： DE WINTER, Laurentius, Cornelius ,  STOLK, Roland, Pieter ,  STAALS, Frank ,  VAN OOSTEN, Anton, Bernhard ,  HINNEN, Paul, Christiaan ,  JOCHEMSEN, Marinus ,  THEEUWES, Thomas ,  VAN SETTEN, Eelco

IPC: G03F7/20 ,  G03F1/24 ,  G21K1/06

Abstract: Disclosed is a method of measuring focus performance of a lithographic apparatus, and corresponding patterning device and lithographic apparatus. The method comprises using the lithographic apparatus to print one or more first printed structures and second printed structures. The first printed structures are printed by illumination having a first non-telecentricity and the second printed structures being printed by illumination having a second non-telecentricity, different to said first non-telecentricity. A focus dependent parameter related to a focus- dependent positional shift between the first printed structures and the second printed structures on said substrate is measured and a measurement of focus performance based at least in part on the focus dependent parameter is derived therefrom.

公开(公告)号：WO2019042809A1

公开(公告)日：2019-03-07

申请号：PCT/EP2018/072432

申请日：2018-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER POST, Sietse, Thijmen ,  BÄUMER, Stefan, Michael, Bruno ,  VAN VOORST, Peter, Danny ,  TUKKER, Teunis, Willem ,  ZIJP, Ferry ,  NIENHUYS, Han-Kwang ,  VAN DEN EERENBEEMD, Jacobus, Maria, Antonius

IPC: G21K1/06 ,  G03F7/00 ,  G03F7/20 ,  G02B17/04

Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration- correcting reflector.

公开(公告)号：WO2019037953A1

公开(公告)日：2019-02-28

申请号：PCT/EP2018/069265

申请日：2018-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： LI, Fahong ,  GARCIA GRANDA, Miguel ,  LUIJTEN, Carlo, Cornelis, Maria ,  SEGERS, Bart, Peter, Bert ,  VAN DER POEL, Cornelis, Andreas, Franciscus, Johannes ,  STAALS, Frank ,  VAN OOSTEN, Anton, Bernhard ,  RIDANE, Mohamed

IPC: G03F7/20

Abstract: Focus performance of a lithographic apparatus is measured using pairs of targets that have been exposed (1110) with an aberration setting (e.g. astigmatism) that induces a relative best focus offset between them. A calibration curve (904) is obtained in advance by exposing similar targets on FEM wafers (1174, 1172). In a set-up phase, calibration curves are obtained using multiple aberration settings, and an anchor point (910) is recorded, where all the calibration curves intersect. When a new calibration curve is measured (1192), the anchor point is used to produce an adjusted updated calibration curve (1004') to cancel focus drift and optionally to measure drift of astigmatism. Another aspect of the disclosure (Fig. 13-15) uses two aberration settings (+AST, -AST) in each measurement, reducing sensitivity to astigmatism drift. Another aspect (Fig. 16-17) uses pairs of targets printed with relative focus offsets, by double exposure in one resist layer.

公开(公告)号：WO2021032369A1

公开(公告)日：2021-02-25

申请号：PCT/EP2020/069935

申请日：2020-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： PANDEY, Nitesh

IPC: G03F7/20 ,  G01M11/02

Abstract: Disclosed is a detection apparatus for a metrology device operable to measure a parameter of interest from scattered radiation having been scattered from a sample. The detection device comprises a detector comprising an array of pixels. The array of pixels comprises imaging pixels for detecting an image from which the parameter of interest is determined, and direction detecting pixels for detecting the angle of incidence of said scattered radiation on said detector.

公开(公告)号：WO2020254138A1

公开(公告)日：2020-12-24

申请号：PCT/EP2020/065890

申请日：2020-06-09

Applicant: ASML NETHERLANDS B.V.

Inventor： BAUERSCHMIDT, Sebastian, Thomas ,  UEBEL, Patrick, Sebastian ,  GÖTZ, Peter, Maximilian

IPC: G02B6/02 ,  G02B6/36 ,  G03F7/20

Abstract: A mounted hollow-core fibre arrangement comprising a hollow-core fibre having a microstructure, and a mount arrangement comprising a plurality of mounting contacts configured to apply a force to an outer layer of the hollow-core fibre. A portion of the hollow-core fibre is located in a receiving region of the mount arrangement. The plurality of mounting contacts are positioned around the receiving region. The mounting contacts are distributed around the receiving region, the distribution of the mounting contacts corresponding to a distribution of features of the microstructure of the hollow-core fibre. The mounted hollow core fibre can be used in a radiation source apparatus for providing broadband radiation.

公开(公告)号：WO2020200637A1

公开(公告)日：2020-10-08

申请号：PCT/EP2020/055906

申请日：2020-03-05

Applicant: ASML NETHERLANDS B.V.

Inventor： UEBEL, Patrick, Sebastian ,  BAUERSCHMIDT, Sebastian, Thomas ,  GÖTZ, Peter, Maximilian

IPC: G02B6/02 ,  H01S3/00 ,  C03B37/012

Abstract: An optical fiber, an apparatus for receiving input radiation and broadening a frequency range, a radiation source, a metrology arrangement and a lithographic apparatus are provided. The optical fiber comprises a hollow core, a cladding portion and a support portion. The cladding portion surrounds the hollow core and comprises a plurality of anti-resonance elements for guiding radiation through the hollow core. The support portion surrounds and supports the cladding portion and comprises an inner support portion, an outer support portion and a deformable connecting portion that connects the inner support portion to the outer support portion.

公开(公告)号：WO2020193075A1

公开(公告)日：2020-10-01

申请号：PCT/EP2020/055288

申请日：2020-02-28

Applicant: ASML NETHERLANDS B.V.

Inventor： UEBEL, Patrick, Sebastian ,  BAUERSCHMIDT, Sebastian, Thomas ,  SCHOLTES - VAN EIJK, Paul, William

IPC: G02F1/355

Abstract: An apparatus (100) for receiving input radiation (108) and broadening a frequency range of the input radiation so as to provide broadband output radiation (110). The apparatus comprises a fiber (102), wherein the fiber (102) may comprise a hollow core (104) for guiding radiation propagating through the fiber (102). The apparatus (100) further comprises an apparatus for providing a gas mixture (106) within the hollow core (104). The gas mixture (106) comprises a hydrogen component, and a working component, wherein the working component is for broadening a frequency range of a received input radiation (108) so as to provide the broadband output radiation (110). The apparatus may be included in a radiation source.