Invention Application
- Patent Title: IMPROVEMENTS IN METROLOGY TARGETS
-
Application No.: PCT/EP2020/069001Application Date: 2020-07-06
-
Publication No.: WO2021013519A1Publication Date: 2021-01-28
- Inventor: MEHTA, Nikhil , COTTAAR, Jeroen , WARNAAR, Patrick , VAN DER SCHAAR, Maurits , VAN KRAAIJ, Markus, Gerardus, Martinus, Maria , CRAMER, Hugo, Augustinus, Joseph , ZWIER, Olger, Victor
- Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
- Applicant Address: P.O. Box 324 5500 AH Veldhoven NL
- Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee: ASML NETHERLANDS B.V.,ASML HOLDING N.V.
- Current Assignee Address: P.O. Box 324 5500 AH Veldhoven NL
- Agency: WILLEKENS, Jeroen Pieter Frank
- Priority: US62/877,569 20190723; EP19194215.0 20190829
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20 ; G03F1/42
Abstract:
Disclosed is a patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device comprises target patterning elements for patterning at least one target from which a parameter of interest can be inferred. The target patterning elements and product patterning elements for patterning the product structures. The target patterning elements and product patterning elements are configured such that said at least one target has at least one boundary which is neither parallel nor perpendicular with respect to said product structures on said substrate.
Information query