Invention Application
- Patent Title: DARK FIELD DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD
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Application No.: PCT/EP2020/079540Application Date: 2020-10-21
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Publication No.: WO2021121733A1Publication Date: 2021-06-24
- Inventor: COENE, Willem, Marie, Julia, Marcel , DEN BOEF, Arie, Jeffrey , TENNER, Vasco, Tomas , PANDEY, Nitesh , MESSINIS, Christos , DE BOER, Johannes Fitzgerald
- Applicant: ASML NETHERLANDS B.V. , STICHTING VU , STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN , UNIVERSITEIT VAN AMSTERDAM
- Applicant Address: P.O. Box 324; De Boelelaan 1105; Winthontlaan 2; Spui 21
- Assignee: ASML NETHERLANDS B.V.,STICHTING VU,STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN,UNIVERSITEIT VAN AMSTERDAM
- Current Assignee: ASML NETHERLANDS B.V.,STICHTING VU,STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN,UNIVERSITEIT VAN AMSTERDAM
- Current Assignee Address: P.O. Box 324; De Boelelaan 1105; Winthontlaan 2; Spui 21
- Agency: ASML NETHERLANDS B.V.
- Priority: EP19216970.4 2019-12-17
- Main IPC: G03H1/04
- IPC: G03H1/04 ; G03H1/26 ; G03F7/20
Abstract:
A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination device configured to provide at least: a first beam pair comprising a first illumination beam of radiation (1010) and a first reference beam of radiation (1030) and a second beam pair comprising a second illumination beam of radiation (1020) and a second reference beam of radiation (1040); and one or more optical elements (1070) operable to capture a first scattered radiation and to capture a second scattered radiation scattered by the structure resultant from the first and second illumination beams respectively. The beams of the first beam pair are mutually coherent and the beams of the second beam pair are mutually coherent. The illumination device is configured to impose incoherence (ADI) between the first beam pair and second beam pair.
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