Invention Application
- Patent Title: PLANARIZATION METHOD AND PHOTOCURABLE COMPOSITION
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Application No.: PCT/JP2021/021718Application Date: 2021-06-08
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Publication No.: WO2021256327A1Publication Date: 2021-12-23
- Inventor: ITO Toshiki , KIYOHARA Naoki , CHIBA Keiko , STACHOWIAK Timothy Brian , YAMASHITA Keiji
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: 30-2, Shimomaruko 3-chome, Ohta-ku, Tokyo
- Agency: OKABE Yuzuru et al.
- Priority: US17/320,906 2021-05-14
- Main IPC: H01L21/027
- IPC: H01L21/027 ; B05D1/36 ; B05D3/067 ; B05D3/12 ; B05D5/00 ; G03F7/094 ; G03F7/168
Abstract:
A substrate surface planarization method includes an arranging step of arranging a liquid curable composition onto a substrate surface having unevenness, a waiting step of waiting until the surface of the layer of the liquid curable composition becomes smooth, and a light exposure step of applying light to cure the layer of the liquid curable composition in this order. The arranging step includes a first arranging step of arranging a layer made of a first liquid curable composition (A1) containing at least a polymerizable compound (a1), and a second arranging step of arranging droplets of a second liquid curable composition (A2) containing at least a polymerizable compound (a2) onto the layer made of the first liquid curable composition (A1) by dropping the droplets discretely.
Information query
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