公开(公告)号：WO2013094390A1

公开(公告)日：2013-06-27

申请号：PCT/JP2012/081223

申请日：2012-11-26

Applicant: CANON KABUSHIKI KAISHA

Inventor： MATSUFUJI Naoko ,  ITO Toshiki ,  KOMATSU Kanae

IPC: C08F2/50 ,  H01L21/027 ,  C07C271/12 ,  C07C271/24

CPC classification number: B29C59/026 ,  B29L2031/3425 ,  C08F2/50 ,  H01L21/266 ,  H01L21/3081 ,  Y10T428/24802

Abstract: A photo-curable composition contains a radicalpolymerizable monomer (A), a photopolymerization initiator (B), and a compound (C) Serving as a sensitizer and having the following general formula(1). X1 and X2 are selected from the group consisting of a hydrogen atom, alkyl groups, a phenyl group, a naphthyl group, and alkyl groups in which part or all of the hydrogen atoms are substituted with fluorine. X1 and X2 may be the same or different. R1 to R10 are independently selected from the group consisting of a hydrogen atom, halogen atoms, alkyl groups, alkoxy groups, a phenyl group, a naphthyl group, and alkyl groups in which part or all of the hydrogen atoms are substituted with fluorine. R1 to R10 may be the same or different.

Abstract translation: 光固化性组合物含有可自由基聚合的单体（A），光聚合引发剂（B）和作为敏化剂的化合物（C），具有以下通式（1）。 X 1和X 2选自氢原子，烷基，苯基，萘基和其中部分或全部氢原子被氟取代的烷基。 X1和X2可以相同或不同。 R 1至R 10独立地选自氢原子，卤素原子，烷基，烷氧基，苯基，萘基和部分或全部氢原子被氟取代的烷基。 R1至R10可以相同或不同。

公开(公告)号：WO2021256333A1

公开(公告)日：2021-12-23

申请号：PCT/JP2021/021841

申请日：2021-06-09

Applicant: CANON KABUSHIKI KAISHA

Inventor： ITO Toshiki ,  WAN Fen

IPC: C08L101/00 ,  C09K21/14 ,  G02B3/08 ,  G02B5/1857 ,  G02B5/3025 ,  G03F7/0002 ,  G03F7/0005 ,  G03F7/029 ,  H01L21/0274 ,  H01L21/266

Abstract: An object is to provide a photo-curable composition having high dry etching resistance and high thermal stability. A photo-curable composition includes at least a polymerizable compound (A) and a photopolymerization initiator (B), and further includes at least one of a flame retarder (E) and a flame-retardant polymerizable compound (F).

公开(公告)号：WO2021256327A1

公开(公告)日：2021-12-23

申请号：PCT/JP2021/021718

申请日：2021-06-08

Applicant: CANON KABUSHIKI KAISHA

Inventor： ITO Toshiki ,  KIYOHARA Naoki ,  CHIBA Keiko ,  STACHOWIAK Timothy Brian ,  YAMASHITA Keiji

IPC: H01L21/027 ,  B05D1/36 ,  B05D3/067 ,  B05D3/12 ,  B05D5/00 ,  G03F7/094 ,  G03F7/168

Abstract: A substrate surface planarization method includes an arranging step of arranging a liquid curable composition onto a substrate surface having unevenness, a waiting step of waiting until the surface of the layer of the liquid curable composition becomes smooth, and a light exposure step of applying light to cure the layer of the liquid curable composition in this order. The arranging step includes a first arranging step of arranging a layer made of a first liquid curable composition (A1) containing at least a polymerizable compound (a1), and a second arranging step of arranging droplets of a second liquid curable composition (A2) containing at least a polymerizable compound (a2) onto the layer made of the first liquid curable composition (A1) by dropping the droplets discretely.