Invention Application
- Patent Title: COZRTA(X) SPUTTERING TARGET WITH IMPROVED MAGNETIC PROPERTIES
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Application No.: PCT/EP2021/083887Application Date: 2021-12-02
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Publication No.: WO2022122525A2Publication Date: 2022-06-16
- Inventor: KONIETZKA, Uwe , SCHLOTT, Martin
- Applicant: MATERION ADVANCED MATERIALS GERMANY GMBH
- Applicant Address: Borsigstraße 10
- Assignee: MATERION ADVANCED MATERIALS GERMANY GMBH
- Current Assignee: MATERION ADVANCED MATERIALS GERMANY GMBH
- Current Assignee Address: Borsigstraße 10
- Agency: KADOR & PARTNER PARTG MBB
- Priority: EP20212374.1 2020-12-08
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/34 ; C22C19/07 ; C22F1/10 ; C23C14/14 ; C23C14/3414 ; G11B5/851 ; H01J37/3405 ; H01J37/3429 ; H01J37/3491
Abstract:
The present invention relates to a sputtering target consisting of an alloy consisting of Co, Zr, Ta and, optionally, one or more further element(s) X from the group of Mo, Pd, Ni, Ti, V, W, and B, characterized in that the target has a maximum magnetic permeability µmax of 60 or lower and/or characterized in that the target has a maximum pass through flux (PTF) variation (FMax-FMin)/FAverage of 0.2 or lower, preferably of 0.15 or lower, and most preferably of 0.10 or lower.
Public/Granted literature
- WO2022122525A1 COZRTA(X) SPUTTERING TARGET WITH IMPROVED MAGNETIC PROPERTIES Public/Granted day:2022-06-16
Information query
