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公开(公告)号：EP0390092A2
公开(公告)日：1990-10-03
申请号：EP90105852.9
申请日：1990-03-27
IPC分类号： G01D5/38
CPC分类号： G01D5/38
摘要： An encoder of this invention radiates a light beam (20) onto an optical scale, in which a reflection film is formed on a surface of a relief type diffraction grating (3) formed on one surface of a light-transmission substrate (1), from a surface opposite to the formation surface of the diffraction grating (3), and detects a change in intensity of interference light caused by diffracted light (21, 22) produced by the diffraction grating, thereby measuring a displacement of the optical scale.
摘要翻译： 本发明的编码器将光束（20）照射到光学标尺上，其中在形成于透光衬底（1）的一个表面上的浮雕型衍射光栅（3）的表面上形成反射膜， 从衍射光栅（3）的形成面的相反侧的面观察由衍射光栅产生的衍射光（21,22）引起的干涉光的强度变化来测定光学标尺的位移。
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3.发明公开Method and apparatus for detecting a reference position of a rotating scale 失效Verfahren und Vorrichtung zum Detektieren einer Referenzposition einer rotierenden Skala。
公开(公告)号：EP0361457A2
公开(公告)日：1990-04-04
申请号：EP89117894.9
申请日：1989-09-27
IPC分类号： G01D5/36
CPC分类号： G01D5/36
摘要： In the reference-position detection method and apparatus for detecting a reference position of a scale, first and second patterns are disposed on the scale so that respective detection timings shift inversely to each other in response to a deviation in attitude of the scale. The first and second patterns are detected with timings different from each other by corresponding first and second sensors, and the reference position of the scale is determined according to outputs of respective sensors. Hence, even if the attitude of the scale changes from a predetermined attitude due to an inclination of the scale or a deviation in position of the scale, it is possible to exactly detect the reference position of the scale. Accordingly, it becomes also possible to increase the performance of a displacement measuring apparatus.
摘要翻译： 在用于检测刻度的基准位置的基准位置检测方法和装置中，第一和第二图案设置在刻度上，使得各个检测定时响应于刻度的姿态偏差而相反地移动。 通过相应的第一和第二传感器以不同的定时检测第一和第二图案，并且根据各个传感器的输出来确定标尺的参考位置。 因此，即使由于刻度的倾斜或刻度的位置的偏差，刻度的状态从预定姿态变化，也可以准确地检测刻度尺的基准位置。 因此，也可以提高位移测量装置的性能。
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公开(公告)号：EP0420287B1
公开(公告)日：1996-12-11
申请号：EP90118745.0
申请日：1990-09-28
发明人： Ishii, Satoshi
IPC分类号： G01D5/245
CPC分类号： G01D5/24404
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公开(公告)号：EP0364984A2
公开(公告)日：1990-04-25
申请号：EP89119346.8
申请日：1989-10-18
CPC分类号： G01D5/38
摘要： An interferometer for measuring the displacement of a diffraction grating includes a multi-mode semiconductor laser (1) for generating a laser beam; a device (20) for supplying a predetermined current to the laser so that at least five vertical modes occur in an oscillation spectrum of the laser beam generated by the laser at an intensity ratio of at least 0.05; and an optical system (3) for splitting the laser beam generated by the laser into first and second beams. The optical system also directs the first and second beams to the diffraction grating (6) and effects interference between a first diffracted light beam generated by the diffraction of the first beam at the diffraction grating and a second diffracted light beam generated by the diffraction of the second beam at the diffraction grating to produce an interference light beam. Also provided is a photoelectric convertor (13) for converting the interference light beam into an electrical signal.
摘要翻译： 用于测量衍射光栅的位移的干涉仪包括用于产生激光束的多模半导体激光器（1）; 用于向所述激光器提供预定电流，使得由所述激光器产生的所述激光束的振荡光谱以至少为0.05的强度比发生至少五个垂直模式的装置（20） 以及用于将由激光器产生的激光束分成第一和第二光束的光学系统（3）。 光学系统还将第一和第二光束引导到衍射光栅（6），并且在衍射光栅处的第一光束的衍射产生的第一衍射光束和由衍射光栅的衍射产生的第二衍射光束之间产生干涉 在衍射光栅处的第二光束产生干涉光束。 还提供了一种用于将干涉光束转换成电信号的光电转换器（13）。
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公开(公告)号：EP0577088B2
公开(公告)日：2010-10-20
申请号：EP93110388.1
申请日：1993-06-29
CPC分类号： G01D5/34715 , G01D5/38
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8.发明公开Interpolation apparatus and position detection apparatus using same 失效Interpolationsanordnung und Positionsdetektionsanordnung selbiges benutzend
公开(公告)号：EP0821219A1
公开(公告)日：1998-01-28
申请号：EP97112739.4
申请日：1997-07-24
IPC分类号： G01D5/244
CPC分类号： G01D5/24404
摘要： An apparatus for performing an interpolating process of an input periodic signal is made up of: at least one first board in which a partial circuit to perform the interpolating process is formed as a block; and a second board on which a plurality of first boards can be mounted, wherein the number of interpolations of the interpolating process can be selected in accordance with the number of first boards which are mounted on the second board.
摘要翻译： 用于执行输入周期信号的内插处理的装置由以下部件组成：至少一个第一板，其中执行内插处理的部分电路被形成为块; 以及可以在其上安装多个第一板的第二板，其中可以根据安装在第二板上的第一板的数量来选择内插工艺的内插次数。
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9.发明授权
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公开(公告)号：EP0364984A3
公开(公告)日：1990-06-13
申请号：EP89119346.8
申请日：1989-10-18
CPC分类号： G01D5/38
摘要： An interferometer for measuring the displacement of a diffraction grating includes a multi-mode semiconductor laser (1) for generating a laser beam; a device (20) for supplying a predetermined current to the laser so that at least five vertical modes occur in an oscillation spectrum of the laser beam generated by the laser at an intensity ratio of at least 0.05; and an optical system (3) for splitting the laser beam generated by the laser into first and second beams. The optical system also directs the first and second beams to the diffraction grating (6) and effects interference between a first diffracted light beam generated by the diffraction of the first beam at the diffraction grating and a second diffracted light beam generated by the diffraction of the second beam at the diffraction grating to produce an interference light beam. Also provided is a photoelectric convertor (13) for converting the interference light beam into an electrical signal.
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