公开(公告)号：EP2030293A4

公开(公告)日：2017-08-09

申请号：EP07809287

申请日：2007-05-31

申请人： CYMER LLC

发明人： CONWAY JOSEPH E ,  SHARMA YOGESH

IPC分类号： H01S3/22 ,  C30B13/24 ,  C30B29/06 ,  C30B33/02 ,  C30B35/00

CPC分类号： C30B35/00 ,  B23K26/064 ,  C30B1/02 ,  C30B29/06 ,  C30B33/02

摘要： A pulsed DUV workpiece treatment apparatus and method for delivering light to irradiate the workpiece, for crystallization of a material on the workpiece, carried on a work stage, which may comprise a pulsed laser DUV light source and an optical train producing a very narrow width very elongated beam of light pulses with a set of parameters required to be maintained within a respective selected narrow range of values on a pulse to pulse basis is disclosed, which may comprise: a laser controller; a work stage controller; a system controller receiving process recipe control demands from a customer recipe control command generator and providing control signals to the laser controller and the workstage controller, which may comprise: a database driven process controller which may comprise: a database containing generic process command steps selectable by a user through an external process user interface.

摘要翻译： 脉冲DUV工件处理设备和方法用于传送光以照射工件，用于工件上材料的结晶，在工作台上承载，该工作台可以包括脉冲激光DUV光源和产生非常窄的宽度的光学系统 公开了一种具有一组参数的细长光脉冲光束，该脉冲光束脉冲以脉冲为单位被保持在相应的选定的窄范围值内，该参数可以包括：激光器控制器; 工作台控制器; 系统控制器接收来自用户配方控制命令发生器的处理配方控制要求并向激光控制器和工作台控制器提供控制信号，该控制信号可以包括：数据库驱动的过程控制器，其可以包括：包含通用过程命令步骤的数据库， 用户通过外部过程用户界面。