利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

30 条记录 (耗时 0.016 秒)

    BELICHTEROPTIK UND VORRICHTUNG ZUM HERSTELLEN EINES DREIDIMENSIONALEN OBJEKTS
    1.
    发明公开
    BELICHTEROPTIK UND VORRICHTUNG ZUM HERSTELLEN EINES DREIDIMENSIONALEN OBJEKTS 审中-公开

    公开(公告)号：EP3362835A1

    公开(公告)日：2018-08-22

    申请号：EP16790522.3

    申请日：2016-10-28

    申请人： EOS GmbH Electro Optical Systems

    发明人： PERRET, Hans ,  GRONENBORN, Stephan

    IPC分类号： G02B13/22 ,  B41J2/45

    CPC分类号： G02B19/0009 ,  B22F3/1055 ,  B22F2003/1056 ,  B23K26/0665 ,  B29C64/153 ,  B29C64/268 ,  B33Y10/00 ,  B33Y30/00 ,  B41J2/451 ,  G02B13/22 ,  G03F7/2053 ,  G03F7/2055 ,  G03F7/70416

    摘要： An exposure optical system (20) is used as a fitting and/or retrofitting optical system for a device (1) for producing a three-dimensional object (2) by selectively solidifying, in a layered manner, build material (15) at points corresponding to the cross-section of the object (2) to be produced by the action of electromagnetic radiation (22). The device comprises a radiation source (21), which is able to emit electromagnetic radiation (22) that is suited, when impinging on the points corresponding to the cross-section of the object (2) to be produced of a layer of the build material (15) which is applied in a working surface (7) of the device (1), to bring about the solidifying of the build material (15) at said points. The exposure optical system (20) comprises at least one first object-side lens system (23) which has a first focal length f
    1 and a second image-side lens system (24) which has a second focal length f
    2 , which are arranged in the beam path of the radiation (22) emitted from the radiation source (21). The focal plane of the first lens system (23) and the focal plane of the second lens system (24) coincide in a plane between the two lens systems. The focal plane f
    1 of the first lens system (23) is just as large or larger than the focal length f
    2 of the second lens system (24). The exposure optical system (20) is designed and can be arranged such that the electromagnetic radiation (22) is incident substantially perpendicularly on the working surface (7).

    EINRICHTUNG ZUM ZUFÜHREN VON PULVER FÜR EINE VORRICHTUNG ZUM SCHICHTWEISEN HERSTELLEN EINES DREIDIMENSIONALEN OBJEKTES
    10.
    发明授权
    EINRICHTUNG ZUM ZUFÜHREN VON PULVER FÜR EINE VORRICHTUNG ZUM SCHICHTWEISEN HERSTELLEN EINES DREIDIMENSIONALEN OBJEKTES 有权
    DEVICE FOR送粉用于设备用于生产三维物体层WAYS

    公开(公告)号：EP1189716B1

    公开(公告)日：2004-05-12

    申请号：EP00935217.0

    申请日：2000-06-16

    申请人： EOS GmbH Electro Optical Systems

    发明人： PERRET, Hans ,  GRAF, Bernhard-Franz ,  SAGMEISTER, Ulli, Christian

    IPC分类号： B22F3/00

    CPC分类号： B29C41/36 ,  B22F3/004 ,  B22F2003/1056 ,  B22F2999/00 ,  B29C41/12 ,  B29C64/153 ,  Y02P10/295 ,  B22F3/1055

    摘要： Disclosed is a device for introducing powder to a flat surface (1) of a device which is used to produce a three-dimensional object layer by layer, especially a laser sintering device. The inventive device comprises a first coating device (3) which can be moved backwards and forth by means of a drive mechanism in a second direction extending across a first direction between a first lateral position and a second position located on the opposite side thereof. Said device can be filled with powder in at least one of the positions thereof. In order to simply the device and in order to improve operation, the coating device (3) is provided with a slit (6) which extends over the entire width thereof and is open both at the top and below, in addition to respective smoothing elements (7, 8) disposed on the opposite ends of the surface. A storage chamber (9) is arranged above the coating device (3) in a final lateral position thereof, whereby the volume of said storage chamber is at least equal to the volume of the slit volume located therebelow at each point along the entire width thereof.