摘要:
The invention relates to a sputtering technique for substrate coating. According to one aspect, a plant for coating a substrate (102) via sputtering is provided, which comprises a sputtering target (108) providing a coating material for ejection during a sputtering process and deposition on the substrate. The sputtering target (108) further comprises a dopant material for amplification of a sputtering yield. The dopant material comprises at least one of hafnium, tantalum, tungsten, rhenium, osmium, iridium.
摘要:
The invention relates to a temperature resistant coating system (102) for a transparent substrate (104). The coating system (102) comprises a layer of titanium oxide (108), wherein the layer of titanium oxide (108) comprises at least one of hafnium, tantalum, tungsten, zirconium, molybdenum, vanadium, chromium, and manganese.