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1.发明公开Low-voltage source for narrow electron/ion beams 失效Niederspannungsquellefürschmale Elektronen- /Ionenstrahlenbündel。
公开(公告)号：EP0366851A1
公开(公告)日：1990-05-09
申请号：EP88810742.2
申请日：1988-11-01
IPC分类号： H01J37/073
CPC分类号： H01J37/08 , H01J37/073 , H01J2237/0807
摘要： This source for charged particles comprises a sharply pointed tip (1) and an aperture (2) in a thin sheet of material. If the point of the tip (1) is made sharp enough, i.e., if it ends in a single atom or a trimer of atoms, the electric field existing between the tip (1) and the aperture (2) will cause a stream of electrons to be emitted from the tip (1), pass the aperture (2) and to continue as a beam (4) of free electroms beyond said aperture (2). The sheet (3) carrying the aperture (2) may, for example, be a carbon foil or a metallic foil, including gold.
The distance of the tip (1) from the aperture (2) is in the submicron range, and so is the diameter of said aperture (2). The distance is being held essentially constant by means of a feedback loop system. The divergence of the beam (4) is
If the source is operated in an ultra-high vacuum, the particle beam (4) will consist of free electrons, whereas, if the source is operated in a noble-gas atmospere, the beam (4) will consist of noble-gas ions. Both, the electron beam, as well as the ion beam, contains particles of a very low frequemcy.摘要翻译： 该带电粒子源包括尖锐尖端（1）和薄片材料中的孔（2）。 如果尖端（1）的尖点足够锐利，即如果其以原子的原子或三聚体结束，则尖端（1）和孔（2）之间存在的电场将导致流 从尖端（1）发射的电子通过孔（2）并且作为自由电磁体的光束（4）继续超过所述孔（2）。 携带孔（2）的片材（3）可以是例如碳箔或包含金的金属箔。 尖端（1）与孔（2）的距离在亚微米范围内，所述孔（2）的直径也在此范围内。 通过反馈回路系统将距离保持在基本恒定。 光束（4）的发散度为<2°如果光源在超高真空下工作，则粒子束（4）将由自由电子组成，而如果光源在惰性气体气氛中运行， 梁（4）将由惰性气体离子组成。 电子束以及离子束都包含非常低频率的粒子。
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公开(公告)号：EP0366851B1
公开(公告)日：1994-02-16
申请号：EP88810742.2
申请日：1988-11-01
IPC分类号： H01J37/073
CPC分类号： H01J37/08 , H01J37/073 , H01J2237/0807
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公开(公告)号：EP0351444A1
公开(公告)日：1990-01-24
申请号：EP88111803.8
申请日：1988-07-22
CPC分类号： H01J37/12 , B23K17/00 , H01J9/02 , H01J37/31 , H01J2237/0807 , Y10S977/856 , Y10S977/857 , Y10S977/888 , Y10S977/89
摘要： The method for fabricating exactly aligned apertures for use in electron and ion microscopy involves the placing of a very sharply pointed tip (1) in front of a set of extremely thin metal foils (3, 5) having closely controlled mutual distances in an atmosphere of heavy gas atoms. The application of an elevated voltage at the tip (1) will result in a sputtering operation to commence and erode the metal foils (3, 5) at a location underneath the facing tip (1). The sputtering operation is continued until the first ions are detected to emerge on the far side of the lens structure (2).
摘要翻译： 用于制造用于电子和离子显微镜的精确对准的孔的方法涉及将非常尖锐的尖端（1）放置在一组非常薄的金属箔（3,5）的前面，其具有在 重气原子 在尖端（1）处施加高电压将导致溅射操作以在面对尖端（1）下方的位置开始和侵蚀金属箔（3,5）。 继续进行溅射操作，直到检测到第一离子出现在透镜结构（2）的远侧。
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