IMPROVED POLISHING PADS AND METHODS FOR THEIR USE
    1.
    发明公开
    IMPROVED POLISHING PADS AND METHODS FOR THEIR USE 失效
    VERBESSERTE POLIERKISSEN UND VERFAHREN ZUR VERWENDUNG DERSELBEN

    公开(公告)号:EP0701499A4

    公开(公告)日:1997-08-20

    申请号:EP95915502

    申请日:1995-03-30

    申请人: RODEL INC

    摘要: An improved polishing pad is provided comprising a solid uniform polymer sheet having no intrinsic ability to absorb or transport slurry particles having during use a surface texture or pattern which has both large and small flow channels present simultaneously which permit the transport of slurry across the surface of the polishing pad, where said channels are not part of the material structure but are mechanically produced upon the pad surface. In a preferred version of the invention, the pad texture consists of a macrotexture produced prior to use and a microtexture which is produced by abrasion by a multiplicity of small abrasive points at a regular selected interval during the use of the pad.

    摘要翻译: 提供了一种改进的抛光垫,其包括固体均匀的聚合物片材,其不具有在使用期间吸收或输送具有同时存在的大和小流动通道的表面纹理或图案的浆料颗粒的固有能力,其允许浆料跨越 抛光垫,其中所述通道不是材料结构的一部分,而是在焊盘表面上机械地制造。 在本发明的优选方案中,垫纹理包括在使用之前产生的宏观纹理和在使用垫期间以规则选择的间隔由多个小磨料点磨损产生的微纹理。