公开(公告)号：EP1649923A1

公开(公告)日：2006-04-26

申请号：EP04724399.3

申请日：2004-03-30

申请人： NITTETSU MINING CO., LTD.

发明人： IIDA, Akemitsu ,  MIZUNO, Akira

IPC分类号： B01D53/86 ,  B01J19/08

CPC分类号： B01J19/087 ,  A61L9/22 ,  B01D53/32 ,  B01D53/864 ,  B01D53/8687 ,  B01D2257/30 ,  B01D2257/502 ,  B01D2257/708 ,  B01D2259/818 ,  B01J15/005 ,  B01J2219/0828 ,  B01J2219/083 ,  B01J2219/0875 ,  B01J2219/0896

摘要： A method for treating a gas characterized in that a low temperature plasma is generated in the presence of a metallic oxide oxidation catalyst, and an apparatus for treating a gas characterized by containing a low temperature plasma-generating unit carrying a metallic oxide oxidation catalyst are disclosed. According to the treating method and the treating apparatus, harmful components (such as carbon monoxide or a volatile organic compound) in a gas to be treated can be efficiently oxidized and rendered harmless, a foul odor may be rendered odorless, and further, microorganisms may be removed from and reduced in the treated gas.

摘要翻译： 一种处理气体的方法，其特征在于，在金属氧化物氧化催化剂的存在下产生低温等离子体，并且公开了一种处理气体的装置，其特征在于包含含有金属氧化物氧化催化剂的低温等离子体发生装置 。 根据处理方法和处理装置，待处理气体中的有害成分（例如一氧化碳或挥发性有机化合物）可以被有效地氧化并变得无害，可以使臭味变得无臭，而且微生物可能 在处理过的气体中被去除和还原。

公开(公告)号：EP0870530B1

公开(公告)日：2005-01-19

申请号：EP97933877.9

申请日：1997-08-01

申请人： Nippon Sheet Glass Co., Ltd. ,  NGS Techno-Research Co., Ltd

发明人： TADA, Hiroaki, NSG Techno-Research Co., Ltd. ,  SHIMODA, Koji, NSG Techno-Research Co., Ltd. ,  ITO, Toshiya, NSG Techno-Research Co., Ltd. ,  HATTORI, Akihiko, NSG Techno-Research Co., Ltd.

IPC分类号： B01D53/86 ,  B01J35/02 ,  C03C17/23 ,  B01J35/00

CPC分类号： C03C17/256 ,  B01D53/8687 ,  B01D53/885 ,  B01D2255/802 ,  B01J35/002 ,  B01J35/004 ,  C03C17/3417 ,  C03C2217/212 ,  C03C2217/241 ,  C03C2217/71 ,  C03C2218/10

公开(公告)号：EP1090674A4

公开(公告)日：2001-08-29

申请号：EP99921270

申请日：1999-05-25

申请人： SHIMAKAWA SEISAKUSYO CO LTD

发明人： SHIMAKAWA KENZO

IPC分类号： B01D53/14 ,  B01D53/18 ,  B01D53/86 ,  B01D53/78 ,  B01D53/34 ,  B01D53/72

CPC分类号： B01D53/8687 ,  B01D53/14 ,  B01D53/1487 ,  B01D53/18 ,  B01D53/86

摘要： A device for cleaning a noxious gas comprising a means (11) for supplying a gas containing a noxious gas component, a buffer means using a liquid (42) which dissolves the noxious gas component in the supplied gas temporarily for later releasing, and a means (51) for cleaning the noxious gas component in the gas supplied from the buffer means, wherein the liquid (42) in the buffer means dissolves the noxious gas component when the concentration of the noxious gas component in the supplied gas is high and releases the noxious gas component dissolved thus far when the concentration is low, water being used as the liquid when the noxious gas is ethylene oxide.

公开(公告)号：EP1090674A1

公开(公告)日：2001-04-11

申请号：EP99921270.7

申请日：1999-05-25

申请人： Shimakawa Seisakusyo Co., Ltd.

发明人： SHIMAKAWA, Kenzo

IPC分类号： B01D53/78 ,  B01D53/72 ,  B01D53/86

CPC分类号： B01D53/8687 ,  B01D53/14 ,  B01D53/1487 ,  B01D53/18 ,  B01D53/86

摘要： A purifier of a noxious gas is provided with means for supplying a gas containing a noxious gas component, buffer means using a liquid which dissolves the noxious gas component in the supplied gas temporarily and later releases the dissolved noxious gas component, and means for purifying the noxious gas component in the gas supplied from the buffer means. The liquid in the buffer means dissolves the noxious gas component when the concentration of the noxious gas component in the supplied gas is high and releases the noxious gas component dissolved thus far when the concentration is low. When the noxious gas is ethylene oxide, water is used as the liquid.

摘要翻译： 一种有毒气体净化器配备有供应含有毒气体组分的气体的装置，使用暂时溶解供给气体中的有害气体组分的液体的缓冲装置，并随后释放溶解的有毒气体组分，以及净化装置 从缓冲装置供应的气体中的有毒气体成分。 缓冲机构内的液体在供给气体中的有毒气体成分的浓度高时溶解有害气体成分，并且在浓度低时释放迄今为止溶解的有害气体成分。 当有害气体是环氧乙烷时，使用水作为液体。

公开(公告)号：EP0870530A1

公开(公告)日：1998-10-14

申请号：EP97933877.9

申请日：1997-08-01

申请人： NIPPON SHEET GLASS CO., LTD. ,  NGS Techno-Research Co., Ltd

发明人： TADA, Hiroaki, NSG Techno-Research Co., Ltd. ,  SHIMODA, Koji, NSG Techno-Research Co., Ltd. ,  ITO, Toshiya, NSG Techno-Research Co., Ltd. ,  HATTORI, Akihiko, NSG Techno-Research Co., Ltd.

IPC分类号： B01D53/86 ,  B01J35/02

CPC分类号： C03C17/256 ,  B01D53/8687 ,  B01D53/885 ,  B01D2255/802 ,  B01J35/002 ,  B01J35/004 ,  C03C17/3417 ,  C03C2217/212 ,  C03C2217/241 ,  C03C2217/71 ,  C03C2218/10

摘要： Fluorine contained within a photocatalyst layer containing titanium oxide and other metallic oxide semiconductors increases the metallic oxide s photocatalytic activity. The described photocatalyst may be in the form of either film, flake, particulate, or fiber. In addition, it can be used for coating the surface of a base material of various forms, such as sheet, film, flake, particulate, bar, or fiber. When using a base material that has an alkaline-containing glass composition, establishing a fluorine-containing layer, such as a layer of fluorine-containing silicon dioxide and other metallic oxide, between the photocatalyst film and the base material can prevent the deterioration of photocatalytic activity of the photocatalyst layer. The fluorine-containing layer functions as an alkaline barrier that controls the diffusion and migration of alkali metallic ions in the glass fibers, such as Na ions, into the photocatalyst layer. Inorganic fiber- and glass sheet-based photocatalyst bearing materials have an excellent capability to decompose rarefied harmful organic gases, and are suitable for use as interior wall and air filters in super clean enclosed spaces and conveyance spaces for semiconductor production, clean rooms for various other purposes, and office and residential buildings, and for other purposes including air cleaning, antibacterial action, anti-fouling action, and defogging of clear sheets (maintaining hydrophilicity).

公开(公告)号：EP0855934A1

公开(公告)日：1998-08-05

申请号：EP96933365.0

申请日：1996-09-24

申请人： SÜDCHEMIE AG

发明人： ENGELHARDT, Thomas ,  HÄHN, Reinhard

IPC分类号： B01D53 ,  B01J21 ,  B01J23 ,  B01J35 ,  B01J37 ,  C07C2 ,  C07C67 ,  C07C69

CPC分类号： C07C2/66 ,  B01D53/8687 ,  B01D2255/30 ,  B01J21/08 ,  B01J21/16 ,  B01J23/52 ,  B01J23/58 ,  B01J35/04 ,  B01J37/0009 ,  C07C67/055 ,  C07C2521/16 ,  Y02A50/2327

摘要： The description relates to a honeycomb catalyst base primarily consisting of SiO2 which comprises at least one calcined and subsequently acid-leached silicate laminate with a pore volume of some 0.1 to 1.2 ml/g and a specific area (to BET) of some 20 to 400 m2/g and additionally some 10 to 50 wt.%. amorphous silicic acid or amorphous aluminium silicate, and has a web width of some 0.1 to 5 mm, in which the ratio between web width and interstice is about 1:5 to 5:1. The catalyst base can be produced by making at least one finely divided silicate laminate with a specific area of over 10 m2/g, preferably about 40 to 500 m2/g, into a paste with a liquid, preferably water, extruding this into comb-like mouldings, drying the mouldings and calcining them at a temperature of some 50 to 200 °C below the sintering temperature of silicon dioxide or aluminium silicate and subjecting the calcined mouldings to an acid treatment. The catalyst base can be charged with at least one catalytically active element from group (1A, 1B, 2A, 2B, 6A) and/or (8) of the periodic system. The catalyst can be used to produce unsaturated esters from olefines, acids and oxygen in the gas phase, to purify organically polluted exhaust air and to alkylate aromatics, especially for producing ethyl benzole from benzole and ethylene.