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111.发明公开Use of esters or amides of benzoylbenzoic acids as photoinitiators and photopolymerisable composition containing them 失效使用酯或苯甲酰基酸作为光引发剂的酰胺和含有这些化合物的可光聚合的组合物。
公开(公告)号：EP0000705A1
公开(公告)日：1979-02-21
申请号：EP78100370.2
申请日：1978-07-11
Applicant: STAUFFER CHEMICAL COMPANY
Inventor： Photis, James Mitchell, Dr. , Via, Francis A., Dr.
CPC classification number: G03F7/031 , C07C45/46 , C07C45/63 , C07C49/784 , C08F2/50 , Y10S430/124 , Y10S525/922 , C07C49/813
Abstract: A photopolymerizable composition comprising photopolymerizable ethylenically unsaturated compounds and, as the photoinitiator, a benzoyl benzoate having the formula:
wherein X is OR, NHR or NRR; R is an independently selected hydrocarbon of 1 to 30 carbon atoms, alkoxysubst i tuted alkyl of 2 to 12 carbon atoms or aminosubstituted alkyl of 2 to 12 carbon atoms; R' is an independently selected halogen orX; and n and m are independently selected integers from 0 to 3.Abstract translation: 可光聚合组合物的光聚合性，包括烯属不饱和化合物，以及作为光引发剂，具有下式的苯甲酰基苯甲酸酯：...
... worin X是OR，NHR或NRR; R是1至30个碳原子，2至12个碳原子或2至12个碳原子的氨基取代的烷基alkoxysubstituted烷基的独立选择的烃基; R“是独立选择的卤素或X; 和n和m是从0-2的整数unabhängig选择的第三 -
公开(公告)号：EP0230596B1
公开(公告)日：1992-01-02
申请号：EP86117331.8
申请日：1986-12-12
Applicant: STAUFFER CHEMICAL COMPANY
Inventor： Keng-Hsin Hsu, Joanna
IPC: A01N43/70
CPC classification number: A01N41/10 , A01N43/70 , A01N37/22 , A01N2300/00
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公开(公告)号：EP0249813B1
公开(公告)日：1991-07-24
申请号：EP87108081.8
申请日：1987-06-04
Applicant: STAUFFER CHEMICAL COMPANY
Inventor： Knudsen, Christopher Glade
IPC: C07C225/20 , C07C217/14 , C07C239/14 , C07D295/10 , C07D277/04 , A01N35/06 , A01N41/10 , A01N43/78
CPC classification number: C07D295/116 , A01N35/06 , A01N37/44 , A01N41/10 , A01N43/78 , C07C255/00 , C07D277/04
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114.发明授权
公开(公告)号：EP0203658B1
公开(公告)日：1991-04-03
申请号：EP86200851.3
申请日：1986-05-16
Applicant: STAUFFER CHEMICAL COMPANY
Inventor： Sherif, Fawzy Gamaleldin
IPC: C04B28/34
CPC classification number: C04B28/34 , C04B14/06 , C04B14/304 , C04B20/107 , C04B22/0013 , C04B22/062 , C04B38/08 , C04B40/0028 , C04B40/06 , C04B14/08 , C04B24/006
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公开(公告)号：EP0265162B1
公开(公告)日：1991-03-06
申请号：EP87309069.0
申请日：1987-10-14
Applicant: STAUFFER CHEMICAL COMPANY
Inventor： Felix, Raymond Anthony
IPC: C07D263/28 , A01N43/76
CPC classification number: A01N43/76 , C07D263/28
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Patent Agency Ranking116.发明公开
公开(公告)号：EP0303362A3
公开(公告)日：1990-04-18
申请号：EP88306704.3
申请日：1988-07-21
Inventor： Roberts, Auston K. , Trainer, William Edward , Biederman, David L.
CPC classification number: C01B25/003 , C01B25/027 , C01B25/12 , C01B25/20
Abstract: A process for treating a pyrophoric P₄-containing material to convert it to a substantially non-pyrophoric P₂O₅ material is described. The process comprises supplying streams of fluid P₄-containing material and an oxygen-containing gas to a reactor filled with water. The P₄-containing material and the oxygen and the oxygen-containing gas react with one another after both have entered the aqueous medium within the reactor to thereby form the desired P₂O₅ material.
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公开(公告)号：EP0171862B1
公开(公告)日：1990-03-14
申请号：EP85201322.6
申请日：1985-08-16
Applicant: STAUFFER CHEMICAL COMPANY
Inventor： Empie, Mark William
CPC classification number: C12P41/00 , C12P13/04 , C12P13/222
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公开(公告)号：EP0087247B2
公开(公告)日：1989-12-06
申请号：EP83300644.8
申请日：1983-02-09
Applicant: STAUFFER CHEMICAL COMPANY
Inventor： Melachouris, Nicolas , Lee, Chang Rae , Lin, Chifa Felix
IPC: A23J3/00
CPC classification number: A23J3/34
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公开(公告)号：EP0077174B1
公开(公告)日：1989-09-06
申请号：EP82305312.9
申请日：1982-10-06
Applicant: STAUFFER CHEMICAL COMPANY
Inventor： DiSalvo, Anthony Leonard , Tsai, Chung-Chieh
CPC classification number: C08G59/02 , C08G18/58 , C08G18/581 , C08G2120/00
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公开(公告)号：EP0243971A3
公开(公告)日：1989-03-29
申请号：EP87106296.4
申请日：1987-04-30
Applicant: STAUFFER CHEMICAL COMPANY
Inventor： Baker, Don Robert , Brownell, Keith Harvey
IPC: C07D213/82 , C07D213/83 , A01N53/00
CPC classification number: C07D213/75 , A01N53/00
Abstract: Novel fungicidal pyridyl cyclopropane carboxamides having the general structural formula
in which R is selected from the group halogen C 1 -C 3 alkoxy and C 1 -C 3 haloalkoxy, R, is selected from the group of-H and -C≡N; and R 2 is selected from the group of-H, 1-CH 3 ; and 2-CH 3 ; X is O or S; and fungicidally acceptable organic and inorganic salts thereof. These compounds provide excellent control of fungal growth.
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