公开(公告)号：EP0947884B1

公开(公告)日：2004-03-10

申请号：EP99302392.8

申请日：1999-03-29

申请人： ASML Netherlands B.V.

发明人： Van Empel, Tjarko Adriaan Rudolf

IPC分类号： G03F7/20

CPC分类号： G03F7/707

公开(公告)号：EP1256847A1

公开(公告)日：2002-11-13

申请号：EP02253174.3

申请日：2002-05-07

申请人： ASML Netherlands B.V.

发明人： Schrijver, Raymond Laurentius Johannes ,  Van Empel, Tjarko Adriaan Rudolf ,  Baggen, Marcel Koenraad Marie

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70866 ,  G03F7/70933

摘要： A lithographic apparatus has an inner purge compartment 2 surrounding and moving with a moveable component such as a mask table or a substrate table and an outer purge compartment 3 surrounding the inner purge compartment. Purge gas is supplied to the inner compartment and exhausted from the outer compartment so that the inner purge compartment is at an average pressure higher than ambient and the outer compartment is at a pressure lower than ambient. Even when acceleration of the moveable object and compartments cause local pressure variations, the inner compartment is at a higher pressure than the outer compartment so that any gas flow is outward and contamination is prevented from reaching the inner compartment

摘要翻译： 光刻设备具有围绕并且与可移动部件（例如掩模台或基板台）和围绕内部净化室的外部净化隔室3一起移动的内部净化室2。 吹扫气体被供应到内部隔室并从外部隔室排出，使得内部净化室处于高于环境的平均压力，并且外部隔室处于低于环境的压力。 即使当可移动物体和隔间的加速引起局部压力变化时，内隔室处于比外隔室更高的压力，使得任何气体流向外，并且防止污染物到达内隔室