公开(公告)号：EP0877272A1

公开(公告)日：1998-11-11

申请号：EP98201538.0

申请日：1998-05-04

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Florence, James M. ,  Huffman, James ,  Miller, Rodney

IPC: G02B26/08

CPC classification number: G02B26/0841

Abstract: A spatial light modulator (70) comprised of an array of micromirrors (72) each having support post (74). The support post (74) defines support post edges (76) in the upper surface of the mirrors (72). These support post edges (76) are all oriented at 45 degree angles with respect to an incident beam of light from a light source (80) to minimize defraction of light from the edges (76) into the darkfield optics when the mirrors are oriented in the off-state. The present invention achieves an increased contrast ratio of about 20% over conventional designs.

Abstract translation: 由具有支撑柱（74）的微镜阵列（72）组成的空间光调制器（70）。 支撑柱（74）在反射镜（72）的上表面中限定支撑柱边缘（76）。 这些支撑柱边缘（76）都相对于来自光源（80）的入射光束以45度的角度取向，以使得当反射镜被定向在暗视场光学器件中时，将光从边缘（76）的光的最小化 离州。 与常规设计相比，本发明实现了比20％提高的对比度。

公开(公告)号：EP0709802A3

公开(公告)日：1997-12-10

申请号：EP95117184.2

申请日：1995-10-31

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Florence, James M. ,  Gove, Robert J. ,  Markandey, Vishal

IPC: G06K15/12

CPC classification number: H04N1/1903 ,  B41J2/45 ,  G06K15/1247 ,  G06K15/1252 ,  G06K2215/111 ,  G09G3/002 ,  G09G3/20 ,  G09G3/2022 ,  G09G2340/0407 ,  G09G2340/0414 ,  G09G2340/0421 ,  G09G2340/0442 ,  G09G2360/02 ,  H04N1/193 ,  H04N1/1934 ,  H04N1/195 ,  H04N1/19584 ,  H04N5/7458 ,  H04N7/01 ,  H04N9/12 ,  H04N2005/7466

Abstract: The present invention provides a method of ameliorating the effects of misalignment between modulator arrays, and a system using the same. The ability reduce the effects of misalignment allows multiple, smaller, more cost effective arrays to be used instead of one large array. This can reduce the manufacturing costs of the array, especially arrays that are produced using semiconductor manufacturing processes such as the digital micromirror device. To avoid visual artifacts caused by the misalignment of two or more modulator arrays 1702, 1704, the individual arrays are overlapped and the portion of the image is generated by both arrays. The contribution to the combined output by the overlapping arrays varies, with each array making a small contribution to the overlapped area 1706 at one end and a large contribution at the other end of the overlapped area 1706. Because the overlapping portions of the modulator arrays 1712 collectively form a portion of the image, the alignment error is effectively spread over the entire overlapping portion 1706 and is much less noticeable.

Abstract translation: 本发明提供了一种改善调制器阵列之间的未对准的效果的方法和使用其的系统。 降低失准影响的能力允许使用多个，更小，更具成本效益的阵列而不是一个大阵列。 这可以降低阵列的制造成本，特别是使用诸如数字微镜器件的半导体制造工艺制造的阵列。 为了避免由两个或更多个调制器阵列1702,1704的未对准引起的视觉伪影，各个阵列重叠，并且图像的部分由两个阵列产生。 由重叠阵列对组合输出的贡献是不同的，每个阵列在一端对重叠区域1706做出小的贡献，并且在重叠区域1706的另一端具有很大的贡献。因为调制器阵列1712的重叠部分 共同形成图像的一部分，对准误差有效地分散在整个重叠部分1706上，并且不太明显。

公开(公告)号：EP0477566B1

公开(公告)日：1996-12-18

申请号：EP91114435.0

申请日：1991-08-28

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Florence, James M.

IPC: G02B26/08 ,  G09F9/37

CPC classification number: G09G3/346 ,  G02B26/001 ,  G02B26/06 ,  G02B26/0841 ,  G09F9/372 ,  G09G2300/0443

公开(公告)号：EP0709802A2

公开(公告)日：1996-05-01

申请号：EP95117184.2

申请日：1995-10-31

Applicant: TEXAS INSTRUMENTS INCORPORATED

Inventor： Florence, James M. ,  Gove, Robert J. ,  Markandey, Vishal

IPC: G06K15/12

CPC classification number: H04N1/1903 ,  B41J2/45 ,  G06K15/1247 ,  G06K15/1252 ,  G06K2215/111 ,  G09G3/002 ,  G09G3/20 ,  G09G3/2022 ,  G09G2340/0407 ,  G09G2340/0414 ,  G09G2340/0421 ,  G09G2340/0442 ,  G09G2360/02 ,  H04N1/193 ,  H04N1/1934 ,  H04N1/195 ,  H04N1/19584 ,  H04N5/7458 ,  H04N7/01 ,  H04N9/12 ,  H04N2005/7466

Abstract: The present invention provides a method of ameliorating the effects of misalignment between modulator arrays, and a system using the same. The ability reduce the effects of misalignment allows multiple, smaller, more cost effective arrays to be used instead of one large array. This can reduce the manufacturing costs of the array, especially arrays that are produced using semiconductor manufacturing processes such as the digital micromirror device.
To avoid visual artifacts caused by the misalignment of two or more modulator arrays 1702, 1704, the individual arrays are overlapped and the portion of the image is generated by both arrays. The contribution to the combined output by the overlapping arrays varies, with each array making a small contribution to the overlapped area 1706 at one end and a large contribution at the other end of the overlapped area 1706. Because the overlapping portions of the modulator arrays 1712 collectively form a portion of the image, the alignment error is effectively spread over the entire overlapping portion 1706 and is much less noticeable.