公开(公告)号：EP2382452A1

公开(公告)日：2011-11-02

申请号：EP09801343.6

申请日：2009-12-16

申请人： General Electric Company

发明人： WAN, Zhaoyang ,  GEIGER, Gary, Edwin ,  JOHNSON, Glenn, Alfred ,  LASIUK, Brian, Walter

IPC分类号： G01N17/00 ,  C02F5/08 ,  C23F11/08 ,  G05B13/04 ,  G05B15/02 ,  G05B21/02 ,  G05B23/02 ,  G05D21/02 ,  G01N33/18

CPC分类号： G01N17/00 ,  C02F2103/023 ,  C02F2209/005 ,  C02F2209/06 ,  C02F2303/08 ,  G05D21/02

摘要： A control system is disclosed for monitoring and controlling localized corrosion in an industrial water system, comprising: measuring quantitative localized corrosion rate and at least one controllable water chemistry variable; identifying mathematical correlations between the quantitative localized corrosion rate and the at least one controllable water chemistry variable; establishing mathematical correlations between the controllable water chemistry variable and at least one chemical treatment feed; defining an index derived from current and future values of the localized corrosion rate and an index derived from current and future values of the at least one chemical treatment feed; utilizing a processor to minimize the index of the localized corrosion rate and the index of the at least one chemical treatment feed and determine current and future values of the at least one chemical treatment feed; and implementing only a current value of the at least one chemical treatment feed within the water system.

公开(公告)号：EP2132606B1

公开(公告)日：2011-01-12

申请号：EP08707647.7

申请日：2008-02-11

申请人： SEW-EURODRIVE GmbH & Co. KG

发明人： HAMMEL, Wolfgang

IPC分类号： G05B13/02 ,  G05B13/04 ,  G05B21/02 ,  G05B23/02

CPC分类号： G05B11/06 ,  G05B11/14

摘要： Method for controlling a position and drive for moving an object, wherein a control error between the desired position and the actual position is determined, wherein the control value is determined from the control error by means of linear operations as long as the control error is below an upper critical value and above a lower critical value, and the control value is determined from the control error according to a non-linear function as long as the control error is above the upper critical value and below the lower critical value.

公开(公告)号：EP2047395A2

公开(公告)日：2009-04-15

申请号：EP07812620.8

申请日：2007-07-04

申请人： Arizona Public Service Company

发明人： LAMONTAGNE, Donald, R.

IPC分类号： G06F19/00 ,  G06F17/40 ,  G05B15/00 ,  G05B15/02 ,  G05B21/00 ,  G05B21/02

CPC分类号： H02H5/08 ,  H02H7/04

摘要： A system (30) includes an analysis engine (34) and a notification engine (38) for selective notification of a condition (72) of an apparatus (26) monitored by a monitoring device (28). A method executed by the system (30) receives (116) data elements (58) from the monitoring device (28), processes (118) the data elements (58) to detect the condition (72) of the apparatus (26), and determines that the condition (72) defines an exception (74) to a normal condition (70) of the apparatus (26). A first notice (60) of the condition (72) is conveyed (146) to a responsible party (59) at a first instance of determination of the exception (74), and conveyance of a second notice (60) is prevented (140) at a second, subsequent, instance of determination of the exception (74). In addition, communication of the normal condition (70) of the apparatus (26) is prevented.

摘要翻译： 系统（30）包括分析引擎（34）和通知引擎（38），用于选择性地通知由监视设备（28）监控的设备（26）的状态（72）。 由系统（30）执行的方法从监视装置（28）接收（116）数据元素（58），处理（118）数据元素（58）以检测装置（26）的条件（72） 并且确定条件（72）将装置（26）的正常状态（70）定义为异常（74）。 条件（72）的第一通知（60）在第一次确定异常（74）的情况下被传达（146）到责任方（59），并且防止第二通知（60）的传送（140 ）在第二个后续的例外确定例子（74）。 此外，防止了装置（26）的正常状态（70）的通信。

公开(公告)号：EP1315054A1

公开(公告)日：2003-05-28

申请号：EP01956852.6

申请日：2001-08-10

申请人： KABUSHIKI KAISHA YASKAWA DENKI

发明人： NAKAMURA, Hiroshi, c/o K.K. YASKAWA DENKI

IPC分类号： G05B13/04 ,  G05B21/02

CPC分类号： G05B21/02 ,  G05B13/048

摘要： A controlling device of high follow-up accuracy is provided, the prediction accuracy of which is not degraded by an FF signal when the controlled object is feedforward-controlled. The prediction controlling device 1 has a feedforwardsignal generation command filter 2 for generating a future command increment which is an increment from one sampling period to the next sampling period of a target command signal from the present to a multiple-sampling future and the feedforward signal from the future target command signal. A prediction controller 3 receives the future command increment, the feedforward signal, and a controlled object output at the past sampling time over zero sampling, and determines the future error prediction value by using a transfer function model from the feedforward signal and the control input to the controlled object output, determines the control input so that the performance function of the error prediction value and the control input may be minimized, and the control input is given to the controlled object 9.

摘要翻译： 提供具有高后续精度的控制装置，当受控对象被前馈控制时，其预测精度不会被FF信号降级。 预测控制装置1具有用于产生未来命令增量的馈入的信号生成指令滤波器2，该未来命令增量是从当前到多采样未来的目标指令信号的一个采样周期到下一个采样周期的增量，以及来自 未来目标指挥信号。 预测控制器3通过零采样在过去的采样时间接收未来的指令增量，前馈信号和受控对象输出，并且通过使用从前馈信号和控制输入到的传递函数模型来确定未来的误差预测值 控制对象输出确定控制输入，使得误差预测值和控制输入的性能函数可以最小化，并且将控制输入给予受控对象9.

公开(公告)号：EP1213635A2

公开(公告)日：2002-06-12

申请号：EP01124179.1

申请日：2001-10-11

申请人： Eni Technology, Inc.

发明人： Keane, Anthony R. A. ,  Gill, Daniel M.

IPC分类号： G05B21/02

CPC分类号： G05B19/19 ,  G05B19/042 ,  G05B21/02 ,  G05B2219/34119 ,  G05B2219/34122

摘要： The present control circuit and method extends the operating range of digitally sampled control loops. A programmable output of a generator is controlled. The programmable output includes a an output level having a corresponding set point. The generator has a drive input that is driven to an actual drive point for controlling the output level of the programmable output. A set point corresponding to a requested output level is determined. A predicted drive point is then determined. The actual drive point of the generator drive input is forced to the predicted drive point. The output level of the programmable output is sensed. A digital output signal that is representative of the sensed output level is generated. The actual drive point of the generator drive input is controlled based on the digital output signal, such that the output level of the programmable output is controlled. The actual drive point corresponding to the requested output level is then stored.

摘要翻译： 本控制电路和方法扩展了数字采样控制回路的工作范围。 控制发电机的可编程输出。 可编程输出包括具有相应设定点的输出电平。 发电机具有驱动输入，驱动到实际驱动点，用于控制可编程输出的输出电平。 确定对应于所请求的输出电平的设定点。 然后确定预测的驱动点。 发电机驱动输入的实际驱动点被强制到预测的驱动点。 感测到可编程输出的输出电平。 产生表示感测输出电平的数字输出信号。 基于数字输出信号控制发电机驱动输入的实际驱动点，从而控制可编程输出的输出电平。 然后存储与所请求的输出电平对应的实际驱动点。

公开(公告)号：EP1138071A1

公开(公告)日：2001-10-04

申请号：EP00966712.2

申请日：2000-09-12

申请人： Koninklijke Philips Electronics N.V.

发明人： ZHANG, Liming

IPC分类号： H01L21/66 ,  G05B21/02 ,  G05B19/418 ,  B24B37/04 ,  B24B49/03

CPC分类号： B24B37/013 ,  B24B37/042 ,  B24B49/03 ,  G05B19/4163 ,  G05B2219/37398 ,  G05B2219/37602 ,  G05B2219/45232 ,  G05B2219/49085

摘要： A method for optimizing CMP (chemical mechanical polishing) processing of semiconductor wafers on a CMP machine. The optimization method includes the steps of polishing a test series of semiconductor wafers on a CMP machine. During the CMP processing, a film thickness is measured at a first point proximate to the center of each respective wafer using a film thickness detector coupled to the machine. A film thickness at a second point proximate to the outside edge of the respective wafers is also measured. Based upon the in-process film thickness measurements at the first point and the second points, the optimization process determines a polishing profile describing a removal rate and a removal uniformity with respect to a set of process variables. The process variables include different CMP machine settings for the polishing process, such as the amount of down force applied to the wafer. The polishing profile is subsequently used to polish production wafers accordingly. For each production wafer, their respective removal rate and removal uniformity is determined by measuring a film thickness at the center of each production wafer and a film thickness at the outside edge of each production wafer using the film thickness detector. Based upon these measurements, the set of process variables is adjusted in accordance the removal rate and the removal uniformity measurements to optimize the CMP process for the production wafer as each respective wafer is being polished.

公开(公告)号：EP0764295B1

公开(公告)日：1998-09-09

申请号：EP95922566.5

申请日：1995-06-06

申请人： Salut, Gérard

发明人： SALUT, Gérard

IPC分类号： G05B21/02 ,  G06F17/50 ,  G05D1/08

CPC分类号： G06F17/5009 ,  G05B21/02 ,  G05D1/0825 ,  G06F17/18

公开(公告)号：EP0709754A4

公开(公告)日：1996-09-11

申请号：EP94919892

申请日：1994-07-12

申请人： YASKAWA DENKI SEISAKUSHO KK

发明人： NAKAMURA HIROSHI ,  TSURUTA KAZUHIRO

IPC分类号： G05B13/02 ,  G05B13/04 ,  G05B21/02 ,  G05B11/36

CPC分类号： G05B13/048 ,  G05B13/026

摘要： A prediction controller such that the number of memories necessary and the number of operations in one sampling period are small and detection delay of the output of the controlled system is coped with. An increased target command value DELTA r(i+M) after M samplings, and an increased output value DELTA y(i-K) of the controlled system before K(K>/=0) samplings are inputted at the present time i in such a way that the output of the controlled system whose transfer function model is Gp(z) = (b1z +...+ bNbz )/{(1-z ) (1-a1z -...- aNaz )} agrees with the target command, and then, the control input v(i) is output to the controlled system. The prediction controller comprises means for storing the increased target command value, the constant for the prediction control, the increased values of the past outputs, and the control inputs of the past; means for determining a deviation e(i-K) from the increased target command value and the increased output value of the controlled system; and means for determining the control input v(i) at the current time.

公开(公告)号：EP0660211A3

公开(公告)日：1996-01-10

申请号：EP94420336.3

申请日：1994-12-01

申请人： EASTMAN KODAK COMPANY

发明人： Hopkins, Robert William, c/o Eastman Kodak Company ,  Miller, Paige, c/o Eastman Kodak Company ,  Swanson, Ronald Eddy, c/o Eastman Kodak Company ,  Scheible, John Joseph, c/o Eastman Kodak Company

IPC分类号： G05B21/02 ,  G05B11/32

CPC分类号： G05B21/02

摘要： In a manufacturing process using multivariate analysis for statistical process control, data representing a plurality of process and/or product variables is collected during operation of the process. A surrogate variable, representing the overall state of the process is evaluated. The surrogate variable is a function of a plurality of intermediate variables, which in turn are a function of the process and/or product variables. When the value of the surrogate variable is outside of a predetermined limit, the contributions to the surrogate variable by the intermediate variables are calculated. The intermediate variable with the largest contribution is identified and the contributions to the identified intermediate variable by the process variables is calculated. The process variables with the largest contribution to the identified intermediate variable are identified, and used to diagnose and correct the problem with the process.

公开(公告)号：EP0684534A1

公开(公告)日：1995-11-29

申请号：EP95303621.7

申请日：1995-05-26

申请人： MMS SPACE SYSTEMS LIMITED

发明人： Tichborne, Franklin George

IPC分类号： G05B21/02 ,  H02P5/50

CPC分类号： H02P5/50 ,  G05B13/048

摘要： An adaptive control system for a control loop subject to a cyclical or at least partially predictable error includes storage means for storing a plurality of data samples at predetermined intervals representing a model of the system error over at least part of a cycle or said predictable portion, and means for determining the sign of the system error at intervals corresponding to said predermined intervals, and for incrementing or decrementing the value of the respective data samples accordingly.

摘要翻译： 用于具有循环或至少部分可预测的误差的控制回路的自适应控制系统包括用于以预定间隔存储多个数据样本的存储装置，其表示在循环的至少一部分或所述可预测部分上的系统误差的模型， 以及用于以对应于所述预定间隔的间隔确定系统误差的符号的装置，并且用于相应地递增或递减各个数据样本的值。