A pellicle for lithography
    201.
    发明公开
    A pellicle for lithography 审中-公开
    PellikelfürLithographie

    公开(公告)号:EP2455809A2

    公开(公告)日:2012-05-23

    申请号:EP11358012.0

    申请日:2011-11-15

    发明人: Shirasaki, Toru

    IPC分类号: G03F1/62 G03F1/64

    CPC分类号: G03F1/62 G03F1/64

    摘要: There is provided a pellicle in which the mask-bonding agglutinant layer has the adhesion strength of 1 N/m through 100 N/m, preferably 4 N/m through 80 N/m, and more preferably the agglutinant layer has a facial flatness of 15 micrometers or smaller, and still more preferably the membrane-bonding adhesive layer has a facial flatness of 15 micrometers or smaller: for the purpose of better preventing the pellicle frame from affecting the mask to deform.

    摘要翻译: 提供一种防护薄膜,其中掩模粘合凝集层的粘合强度为1N / m至100N / m,优选为4N / m至80N / m,更优选地,粘着强度层具有面状平坦度 15微米以下,进一步优选膜粘合层具有15微米或更小的面部平整度:为了更好地防止防护薄膜组件框架影响掩模变形。