摘要:
The present invention is to provide a pellicle frame characterized by including a metal or alloy having a linear expansion coefficient of 10×10-6 (1/K) or less and further a density of 4.6 g/cm3 or less, and a pellicle characterized by including the pellicle frame as an element.
摘要:
A pellicle is proposed in which the frame is made of an aluminum alloy and at least the inner wall of the frame is entirely coated with a pure aluminum layer, which preferably has a purity of 99.7% or higher and a thickness of 3 through 50 micrometers; the pellicle frame with the pure aluminum layer may be subjected to anodic oxidation treatment, electric coloring, and void filling, and a resin layer can be formed as the outermost layer.
摘要:
A pellicle support frame (1A) is provided with a frame body (10) made of aluminum alloy and has a pellicle film bonded to the upper surface (10a) of the frame body (10) and a transparent substrate bonded to the lower surface of the frame body (10). Within the frame body (10), a plurality of hollow portions (51-53) are provided to be lined up in the circumferential direction of the frame body (10), and a through-hole (20) which leads from the outer peripheral surface (10c) to the inner peripheral surface (10d) of the frame body (10) is formed between two adjacent hollow portions. This configuration makes it possible to prevent strain from arising in the support frame (1A) and the transparent substrate after the support frame (1A) is bonded to the transparent substrate.
摘要:
Foreign object particles generated at the time of trimming is suppressed from being attached to a pellicle film. A method for producing a pellicle according to the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.
摘要:
A pellicle membrane includes a film consisting of an organic material and an inorganic material, wherein a region containing an organic material and a region consisting of an inorganic material are present in the same plane of the film, and wherein at least a central portion of the film is a region consisting of an inorganic material, and at least a peripheral edge portion of the film is a region containing an organic material.
摘要:
Provided is a self-supporting film that has an anti-reflection function independently, so that the self-supporting film exhibits excellent optical characteristics as a result. A self-supporting film has a rugged-structure layer having periodic rugged shapes formed on a surface thereof, with these periodic rugged shapes being formed on at least one surface. The average thickness of the self-supporting film ranges from 0.2 µm to 20.0 µm. The rugged-structure layer has a yield strain of 1% or greater and a tensile elongation of 10% or greater.
摘要:
Provided are a pellicle for extreme ultraviolet light lithography, a production method thereof, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame including a thick portion including a first surface carrying a surface of the first frame opposite to a surface on which the pellicle film is located, and also including a second surface connected with the first surface and carrying a side surface of the first frame, the second frame enclosing the pellicle film and the first frame; a through-hole provided in the thick portion of the second frame; and a filter located on an outer side surface of the second frame and covering the through-hole, the outer side surface crossing the surface of the first frame on which the pellicle film is located.
摘要:
There is provided a pellicle wherein each edge area where the inner wall of the pellicle frame meets the upper end face or the lower end face, respectively, of the pellicle frame consists not only of the conventional single chamfer face but also of additional attempt(s) to make the edge area virtually rounded, such as additional chamfering(s) or rounding, whereby the edge area is devoid of cracking and scars.
摘要:
The present invention provides a pellicle frame that can prevent generation of haze and reduces a surface glittering defect under irradiation with collected light, and a method of manufacturing the pellicle frame. Specifically, provided are a pellicle frame, including: an aluminum frame material formed of aluminum or an aluminum alloy; and an anodic oxide film on a surface of the aluminum frame material, in which the anodic oxide film includes a film formed by using an alkaline anodic oxidation solution and a film formed by using an acid anodic oxidation solution, and a method of manufacturing the pellicle frame.
摘要:
A pellicle membrane includes a film consisting of an organic material and an inorganic material, wherein a region containing an organic material and a region consisting of an inorganic material are present in the same plane of the film, and wherein at least a central portion of the film is a region consisting of an inorganic material, and at least a peripheral edge portion of the film is a region containing an organic material.