PELLICLE FRAME AND PELLICLE
    1.
    发明公开

    公开(公告)号:EP4365678A2

    公开(公告)日:2024-05-08

    申请号:EP24155707.3

    申请日:2018-09-25

    发明人: YANASE, Yu

    IPC分类号: G03F1/64

    CPC分类号: G03F1/64

    摘要: The present invention is to provide a pellicle frame characterized by including a metal or alloy having a linear expansion coefficient of 10×10-6 (1/K) or less and further a density of 4.6 g/cm3 or less, and a pellicle characterized by including the pellicle frame as an element.

    PELLICLE SUPPORT FRAME AND PRODUCTION METHOD

    公开(公告)号:EP3217221A4

    公开(公告)日:2018-07-18

    申请号:EP15856945

    申请日:2015-09-09

    发明人: ISHITO NOBUYUKI

    摘要: A pellicle support frame (1A) is provided with a frame body (10) made of aluminum alloy and has a pellicle film bonded to the upper surface (10a) of the frame body (10) and a transparent substrate bonded to the lower surface of the frame body (10). Within the frame body (10), a plurality of hollow portions (51-53) are provided to be lined up in the circumferential direction of the frame body (10), and a through-hole (20) which leads from the outer peripheral surface (10c) to the inner peripheral surface (10d) of the frame body (10) is formed between two adjacent hollow portions. This configuration makes it possible to prevent strain from arising in the support frame (1A) and the transparent substrate after the support frame (1A) is bonded to the transparent substrate.

    PELLICLE MANUFACTURING METHOD AND METHOD FOR MANUFACTURING PHOTOMASK WITH PELLICLE

    公开(公告)号:EP3291006A1

    公开(公告)日:2018-03-07

    申请号:EP16786296.0

    申请日:2016-04-11

    IPC分类号: G03F1/62 G03F1/24

    摘要: Foreign object particles generated at the time of trimming is suppressed from being attached to a pellicle film. A method for producing a pellicle according to the present invention produces a pellicle including a pellicle film and a pellicle frame supporting an outer peripheral portion of the pellicle film. The method includes forming the pellicle film on a substrate, and bonding a pressure-sensitive adhesive sheet, that is elastic and has a pressure-sensitive adhesive force thereof decreased upon receipt of external stimulation, to each of two surfaces of the substrate; making a notch inside a part of the substrate, the part having the pressure-sensitive adhesive sheets bonded thereto; separating a substrate outer peripheral portion outer to the notch of the substrate, in a state where the pressure-sensitive adhesive sheets are bonded to the substrate, to form a pellicle frame; and stimulating the pressure-sensitive adhesive sheets to peel off the pressure-sensitive adhesive sheets.

    摘要翻译: 在修整时产生的异物颗粒被抑制附着在防护薄膜上。 根据本发明的用于生产防护薄膜组件的方法产生了包括防护薄膜和支撑防护薄膜外围部分的防护薄膜框架的防护薄膜组件。 该方法包括:在基板上形成防护薄膜,并且将弹性的并且在其受到外部刺激时具有降低的压敏粘合力的压敏粘合片粘合至基板的两个表面中的每一个; 在基板的一部分内部形成切口,该部分具有粘合到其上的压敏粘合剂片; 在所述压敏粘合片结合到所述基板的状态下,将所述基板的所述凹口外侧的基板外周部分分离以形成防护薄膜组件框架; 并且刺激压敏粘合剂片材以剥离压敏粘合剂片材。

    SELF-SUPPORTING FILM, SELF-SUPPORTING STRUCTURE, METHOD FOR MANUFACTURING SELF-SUPPORTING FILM, AND PELLICLE
    6.
    发明公开
    SELF-SUPPORTING FILM, SELF-SUPPORTING STRUCTURE, METHOD FOR MANUFACTURING SELF-SUPPORTING FILM, AND PELLICLE 审中-公开
    SELBSTHALTENDER FILM,SELBSTHALTENDE STRUKTUR,VERFAHREN ZUR HERSTELLUNG DES SELBSTHALTENDEN FILMS UND MEMBRAN

    公开(公告)号:EP2560048A4

    公开(公告)日:2017-08-23

    申请号:EP11768899

    申请日:2011-04-13

    IPC分类号: C08J5/18 G03F1/62

    摘要: Provided is a self-supporting film that has an anti-reflection function independently, so that the self-supporting film exhibits excellent optical characteristics as a result. A self-supporting film has a rugged-structure layer having periodic rugged shapes formed on a surface thereof, with these periodic rugged shapes being formed on at least one surface. The average thickness of the self-supporting film ranges from 0.2 µm to 20.0 µm. The rugged-structure layer has a yield strain of 1% or greater and a tensile elongation of 10% or greater.

    摘要翻译: 提供独立地具有防反射功能的自支撑膜,结果自支撑膜表现出优异的光学特性。 自支撑膜具有在其表面上形成的具有周期性凹凸形状的凹凸结构层,这些周期性凹凸形状形成在至少一个表面上。 自支撑膜的平均厚度在0.2μm至20.0μm的范围内。 凹凸结构层的屈服应变为1%以上,拉伸伸长率为10%以上。

    PELLICLE, PRODUCTION METHOD THEREOF, EXPOSURE METHOD
    7.
    发明公开
    PELLICLE, PRODUCTION METHOD THEREOF, EXPOSURE METHOD 审中-公开
    PELLICLE,其生产方法,曝光方法

    公开(公告)号:EP3196699A1

    公开(公告)日:2017-07-26

    申请号:EP15841815.2

    申请日:2015-09-17

    IPC分类号: G03F1/64 H01L21/027

    摘要: Provided are a pellicle for extreme ultraviolet light lithography, a production method thereof, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame including a thick portion including a first surface carrying a surface of the first frame opposite to a surface on which the pellicle film is located, and also including a second surface connected with the first surface and carrying a side surface of the first frame, the second frame enclosing the pellicle film and the first frame; a through-hole provided in the thick portion of the second frame; and a filter located on an outer side surface of the second frame and covering the through-hole, the outer side surface crossing the surface of the first frame on which the pellicle film is located.

    摘要翻译: 本发明提供一种极紫外光光刻用防护薄膜组件及其制造方法以及曝光方法。 根据本发明的防护薄膜组件包括:具有位于其上的防护薄膜的第一框架; 第二框架,所述第二框架包括厚部分,所述厚部分包括第一表面和第二表面,所述第一表面承载所述第一框架的与所述表膜相对的表面,所述第二表面与所述第一表面连接并且承载所述第一框架的侧表面 所述第二框架包围所述薄膜胶片和所述第一框架; 设置在第二框架的厚部分中的通孔; 以及过滤器,其位于所述第二框架的外侧表面上并且覆盖所述通孔,所述外侧表面与所述第一框架的其上设置有所述薄膜膜的表面交叉。

    A PELLICLE
    8.
    发明公开
    A PELLICLE 审中-公开
    一个PELLICLE

    公开(公告)号:EP3190462A1

    公开(公告)日:2017-07-12

    申请号:EP16204218.8

    申请日:2016-12-15

    发明人: HAMADA, Yuichi

    IPC分类号: G03F1/64

    CPC分类号: G03F1/64

    摘要: There is provided a pellicle wherein each edge area where the inner wall of the pellicle frame meets the upper end face or the lower end face, respectively, of the pellicle frame consists not only of the conventional single chamfer face but also of additional attempt(s) to make the edge area virtually rounded, such as additional chamfering(s) or rounding, whereby the edge area is devoid of cracking and scars.

    摘要翻译: 提供了一种防护薄膜组件,其中防护薄膜组件框架的内壁分别与防护薄膜组件框架的上端面或下端面相接触的每个边缘区域不仅包括常规的单个倒角面,而且还包括附加尝试 )以使边缘区域几乎为圆形,例如额外的倒角或圆角,由此边缘区域没有开裂和疤痕。

    PELLICLE FRAME AND PROCESS FOR PRODUCING SAME
    9.
    发明公开
    PELLICLE FRAME AND PROCESS FOR PRODUCING SAME 有权
    MEMBRANRAHMEN UND VERFAHREN ZUR HERSTELLUNG DAVON

    公开(公告)号:EP3062149A4

    公开(公告)日:2017-06-14

    申请号:EP13895841

    申请日:2013-10-23

    IPC分类号: G03F1/64

    CPC分类号: G03F1/64

    摘要: The present invention provides a pellicle frame that can prevent generation of haze and reduces a surface glittering defect under irradiation with collected light, and a method of manufacturing the pellicle frame. Specifically, provided are a pellicle frame, including: an aluminum frame material formed of aluminum or an aluminum alloy; and an anodic oxide film on a surface of the aluminum frame material, in which the anodic oxide film includes a film formed by using an alkaline anodic oxidation solution and a film formed by using an acid anodic oxidation solution, and a method of manufacturing the pellicle frame.

    摘要翻译: 本发明提供一种防护薄膜框架及其制造方法,该防护薄膜框架能够防止雾度的产生,减少在回收光的照射下的表面光亮缺陷。 具体而言,提供一种防护膜框架,其包括:由铝或铝合金形成的铝框架材料; 以及在所述铝框架材料的表面上的阳极氧化膜,其中所述阳极氧化膜包括通过使用碱性阳极氧化溶液形成的膜和通过使用酸性阳极氧化溶液形成的膜,以及制造所述膜的方法 帧。

    PELLICLE FILM, PELLICLE, EXPOSURE MASTER, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    10.
    发明公开
    PELLICLE FILM, PELLICLE, EXPOSURE MASTER, EXPOSURE DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
    PELLIKELFILM,BELICHTUNGS-MASTER,BELICHTUNGSVORRICHTUNG UND VERFAHREN ZUR HERSTELLUNG EINES HALBLEITERBAUEMENTS

    公开(公告)号:EP3133442A1

    公开(公告)日:2017-02-22

    申请号:EP15796576.5

    申请日:2015-05-12

    IPC分类号: G03F1/62

    CPC分类号: G03F1/64 G03F1/62 G03F7/2004

    摘要: A pellicle membrane includes a film consisting of an organic material and an inorganic material, wherein a region containing an organic material and a region consisting of an inorganic material are present in the same plane of the film, and wherein at least a central portion of the film is a region consisting of an inorganic material, and at least a peripheral edge portion of the film is a region containing an organic material.

    摘要翻译: 防护薄膜包括由有机材料和无机材料构成的膜,其中包含有机材料的区域和由无机材料组成的区域存在于膜的同一平面中,并且其中至少中心部分 膜是由无机材料构成的区域,并且膜的至少周边部分是含有有机材料的区域。