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    VERFAHREN ZUM HERSTELLEN EINER METALLOBERFLÄCHE
    24.
    发明公开
    VERFAHREN ZUM HERSTELLEN EINER METALLOBERFLÄCHE 审中-公开

    公开(公告)号：EP3604623A1

    公开(公告)日：2020-02-05

    申请号：EP19193418.1

    申请日：2015-11-23

    申请人： Franz GmbH

    发明人： Franz, Wolf-Dieter

    IPC分类号： C25D5/14 ,  C25D5/40 ,  C25D5/48 ,  C25F3/08 ,  C25F5/00 ,  C25D5/54 ,  C25D5/56

    摘要： Die Erfindung betrifft eine ökonomische Metallisierung, insbesondere von Fahrzeugteilen, durch Entchromen und einen insbesondere Nickelschichten aufweisenden nachfolgenden Prozess, der durch Kombination matter und glänzender Schichten und / oder Einbezug eines mechanischen Schleifprozesses ein einstellbares Oberflächenfinish erlaubt, wobei der Schichtaufbau im Zusammenhang mit dem anfänglichen Entchromen kommerzieller verchromter Teile eine besondere Zuverlässigkeit zeigt.

    METALLIC MATERIAL FOR ELECTRONIC COMPONENT, METHOD FOR MANUFACTURING SAID METALLIC MATERIAL, AND CONNECTOR TERMINAL, CONNECTOR, AND ELECTRONIC COMPONENT IN WHICH SAID METALLIC MATERIAL IS USED
    25.
    发明公开
    METALLIC MATERIAL FOR ELECTRONIC COMPONENT, METHOD FOR MANUFACTURING SAID METALLIC MATERIAL, AND CONNECTOR TERMINAL, CONNECTOR, AND ELECTRONIC COMPONENT IN WHICH SAID METALLIC MATERIAL IS USED 审中-公开

    公开(公告)号：EP3584353A1

    公开(公告)日：2019-12-25

    申请号：EP17896426.8

    申请日：2017-10-26

    申请人： JX Nippon Mining & Metals Corporation

    发明人： ENDO,Satoru

    IPC分类号： C23C28/00 ,  C25D5/48 ,  C25D7/00 ,  H01R13/03

    摘要： The present invention provides a metallic material for electronic components having a low adhesive wear. The metallic material for electronic components comprises a base material, on the base material, a lower layer constituted with one or two or more selected from a constituent element group A consisting of Ni, Cr, Mn, Fe, Co and Cu, on the lower layer, an intermediate layer,
    on the intermediate layer, an upper layer constituted with an alloy comprising one or two selected from a constituent element group B consisting of Sn and In and one or two or more selected from a constituent element group C consisting of Ag, Au, Pt, Pd, Ru, Rh, Os and Ir, and on the upper layer, a treated layer having C content being 60at% or more and O content being 30at% or less. The intermediate layer consists of one or two or more selected from the constituent element group A and one or two selected from the constituent element group B, and when the metallic material is heated at 250 °C for 30 seconds, an area ratio of oxide particles adhering to a surface of the treated layer is 0.1 % or less.

    SURFACE TREATED METAL MATERIAL FOR BURN-IN TEST SOCKET, CONNECTOR FOR BURN-IN TEST SOCKET AND BURN-IN TEST SOCKET USING THE SAME
    29.
    发明公开
    SURFACE TREATED METAL MATERIAL FOR BURN-IN TEST SOCKET, CONNECTOR FOR BURN-IN TEST SOCKET AND BURN-IN TEST SOCKET USING THE SAME 审中-公开

    公开(公告)号：EP3521014A2

    公开(公告)日：2019-08-07

    申请号：EP19154525.0

    申请日：2019-01-30

    申请人： JX Nippon Mining & Metals Corporation

    发明人： ENDO, Satoru

    IPC分类号： B32B15/01 ,  C25D5/10 ,  C25D5/48 ,  C25D5/50 ,  C23C28/02 ,  G01R31/26 ,  H01R13/03 ,  C25D11/36 ,  C22C5/00 ,  C22C5/02 ,  C22C5/04 ,  C22C5/06 ,  C23C30/00 ,  H01B1/02

    摘要： The present invention provides a surface treated metal material for burn-in test socket wherein contact resistance between the contact of the socket and other metal materials being inserted is excellently suppressed when used for the contact for burn-in test socket.
    The surface treated metal material for burn-in test socket, comprising
    a base material,
    a lower layer being constituted with one or two or more selected from the constituent element group A, the constituent element group A consisting of Ni, Cr, Mn, Fe, Co and Cu,
    an intermediate layer formed on the lower layer, the intermediate layer being constituted with one or two or more selected from the constituent element group A and one or two selected from a constituent element group B, the constituent element group B consisting of Sn and In, and
    an upper layer formed on the intermediate layer, the upper layer being constituted with one or two selected from the constituent element group B and one or two or more selected from a constituent element group C, the constituent element group C consisting of Ag, Au, Pt, Pd, Ru, Rh, Os and Ir, wherein
    the thickness of the lower layer is 0.05 µm or more and less than 5.00 µm, the thickness of the intermediate layer is 0.01 µm or more and less than 0.40 µm, and the thickness of the upper layer is 0.02 µm or more and less than 1.00 µm.