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    Apparatus and method for processing a lithographic printing plate
    33.
    发明公开
    Apparatus and method for processing a lithographic printing plate 有权
    装置和方法用于处理平版印刷版

    公开(公告)号：EP2775351A1

    公开(公告)日：2014-09-10

    申请号：EP13158173.8

    申请日：2013-03-07

    申请人： AGFA GRAPHICS NV

    发明人： Desmet, Tim ,  Moriamé, Philippe ,  Hendrikx, Peter ,  Sinnesael, Jan

    IPC分类号： G03F7/30

    CPC分类号： B41C1/10 ,  G03F7/3071

    摘要： An apparatus and method for processing a lithographic printing plate is disclosed. The apparatus (10) comprises (i) plate transport means (4, 12, 12') for conveying the plate (14) through the apparatus; (ii) plate detection means (8) for locating the plate in the apparatus and for determining the plate width; (iii) one or more nozzle(s) (20) for depositing developer on the plate, wherein said nozzle(s) are arranged to shuttle over the plate or are arranged as a fixed array that spans at least the width of the plate. The plate detection means are coupled to the nozzles by means for selectively actuating the nozzles that are positioned to deposit developer across the plate area, which results in a significant reduction of developer consumption. In preferred embodiments, the nozzles apply developer in accordance with the image on the plate, which enables an even lower consumption of developer.

    PROCESS FOR REMOVING SUBSTANCES FROM SUBSTRATES
    35.
    发明公开
    PROCESS FOR REMOVING SUBSTANCES FROM SUBSTRATES 审中-公开
    方法与基体结合器燃料移除

    公开(公告)号：EP2761375A1

    公开(公告)日：2014-08-06

    申请号：EP13720702.3

    申请日：2013-04-24

    申请人： Dynaloy, LLC

    发明人： PETERS, Richard Dalton ,  ACRA, Travis ,  HOCHSTETLER, Spencer Erich

    IPC分类号： G03F7/30

    CPC分类号： B08B3/10 ,  G03F7/425

    摘要： Processes are described to remove substances from substrates, for example, electronic devices. In an embodiment, a process may include providing a substrate including a first side and a second side with a substance being disposed on at least a portion of the first side of the substrate. The process may also include contacting the substrate with a solution such that the first side of the substrate is coated with the solution, at least a portion of the second side is free of the solution and at least a portion of the substance is released from the first side of the substrate. Additionally, the process may include rinsing the substrate to remove at least a portion of the substance released from the first side of the substrate. The process may be suitable for removing and, in some instances, completely dissolving photoresists of the positive and negative varieties.

    METHOD FOR RECYCLING WASTEWATER PRODUCED BY PLATE-MAKING PROCESS
    36.
    发明公开
    METHOD FOR RECYCLING WASTEWATER PRODUCED BY PLATE-MAKING PROCESS 有权
    VERFAHREN ZUR WIEDERVERWERTUNG VON ABWASSER DURCH EIN PLATTENHERSTELLUNGSVERFAHREN

    公开(公告)号：EP2757417A1

    公开(公告)日：2014-07-23

    申请号：EP12832408.4

    申请日：2012-09-14

    申请人： FUJIFILM Corporation

    发明人： KOBAYASHI, Fumikazu ,  WATANABE, Toshihiro ,  AOSHIMA, Norio

    IPC分类号： G03F7/30 ,  B01D1/00 ,  C02F1/04 ,  G03F7/00

    CPC分类号： G03F7/3092 ,  C02F1/04 ,  C02F1/048 ,  C02F2103/40 ,  G03F7/322 ,  Y02B30/52

    摘要： A method of recycling waste liquid from a plate-making process for a photosensitive planographic printing plate that is discharged by a plate-making process for a photosensitive planographic printing plate using a developer liquid for a photosensitive planographic printing plate in an automatic developing machine, includes: replenishing a development bath of the automatic developing machine with a development replenisher liquid without dilution or after dilution of the development replenisher liquid with an amount of water no more than 10 times an amount of the development replenisher liquid in terms of mass, the development replenisher liquid including an organic solvent having a boiling point in a range of from 100°C to 300°C, and a content ratio of organic solvent having a boiling point in a range of from 100°C to 300°C in the development replenisher liquid being in a range of from 5% by mass to 30% by mass; concentrating plate-making process waste liquid, which has been generated during a plate-making process for a photosensitive planographic printing plate in the automatic developing machine, by evaporation using an evaporation concentration apparatus such that a ratio of an amount of the plate-making process waste liquid after the concentrating, to an amount of the plate-making process waste liquid before the concentrating, is in a range of from 1/2.5 to 1/5 in terms of volume, thereby separating the plate-making process waste liquid into water vapor and dissolved components; recovering the separated water vapor from the evaporation concentration apparatus and condensing the water vapor in a cooling means to obtain regenerated water; and using the obtained regenerated water as at least one of diluent water for the development replenisher liquid or rinsing water in the automatic developing machine.

    摘要翻译： 一种从用于感光平版印刷版的制版工艺回收废液的方法，该感光平版印刷版通过使用在自动显影机中的感光平版印刷版的显影剂液体的感光平版印刷版的制版过程而排出， 用显影补充液补充自动显影机的显影浴，不用稀释液或稀释后的显影补充液的量不得超过显影补充液的质量的10倍以上，显影补充液 包括沸点在100℃至300℃的有机溶剂的液体，以及沸点在100℃至300℃范围内的显影补充液中的有机溶剂的含量比 在5质量％至30质量％的范围内; 在自动显影机中的感光平版印刷版的制版过程中产生的浓缩制版工艺废液通过使用蒸发浓缩装置的蒸发使得制版过程的量的比例 浓缩后的废液，浓缩前的制版处理废液的量在体积的1 / 2.5〜1/5的范围内，从而将制版工艺废液分离成水 蒸汽和溶解成分; 从蒸发浓缩装置回收分离出的水蒸汽，并将冷凝装置中的水蒸气冷凝，得到再生水; 并且使用所获得的再生水作为显影补充液的稀释水中的至少一种或自动显影机中的漂洗水。

    METHOD FOR PROCESSING WASTE SOLUTION IN PLATE-MAKING PROCESS OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
    39.
    发明公开
    METHOD FOR PROCESSING WASTE SOLUTION IN PLATE-MAKING PROCESS OF PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE 有权
    方法加工于板块调整方法废液用于光敏平版印刷版

    公开(公告)号：EP2482133A4

    公开(公告)日：2013-08-07

    申请号：EP10818600

    申请日：2010-06-18

    申请人： FUJIFILM CORP

    发明人： AOSHIMA NORIO ,  WATANABE TOSHIHIRO ,  KOBAYASHI FUMIKAZU

    IPC分类号： G03F7/30 ,  G03F7/32

    CPC分类号： G03F7/3092 ,  G03F7/322

    摘要： A method for processing waste solution in the plate-making process of a photosensitive planographic printing plate, with which the maintenance performance of the equipment is excellent, is provided. A method for processing waste solution in the plate-making process, in which the waste solution in the plate-making process, which is discharged when the plate-making process of a photosensitive planographic printing plate is carried out using a developer for a photosensitive planographic printing plate, said developer being characterized by containing at least one sugar selected from non-reducing sugars and at least one base without containing a silicate and by having a pH within the range of from 9.0 to 13.5, is evaporated and concentrated by an evaporative concentration apparatus, thereby being separated into water vapor and a dissolved component, wherein, the waste solution in the plate-making process is heated by a heating means in an evaporation container that is provided with base resistance, and the water vapor separated from the waste solution in the plate-making process is taken out from the evaporation container and condensed in a cooling means, thereby being turned into reclaimed water.