SUBSTITUIERTE RYLENDERIVATE
    45.
    发明授权
    SUBSTITUIERTE RYLENDERIVATE 有权
    取代萘嵌苯的衍生物

    公开(公告)号:EP1904497B1

    公开(公告)日:2011-08-17

    申请号:EP06764095.3

    申请日:2006-07-06

    Applicant: BASF SE

    CPC classification number: C07D493/06 C07D471/06 C08K5/0041 C08K5/3437

    Abstract: The invention relates to rylene derivatives of general formula (I) in which the variables have the following meanings: rylene contains a polycyclic conjugated ring system, which contains at least one perylene unit (formula II), can contain heteroatoms as ring atoms, can be functionalized by groupings containing CO- groups and/or can carry other substituents different from radicals A; A represents a radical of formula (III); X represents oxygen or sulfur; R represents the same or different radicals: optionally substituted alkyl, cycloalkyl, aryl, hetaryl, -U-aryl, U representing a grouping -O-, -S-, -NR2-, -CO-, -SO- or -SO2-, or C1-C12 alkoxy, C1-C6 alkylthio, -C=CR2, -CR2=CR22, hydroxy, mercapto, halogen, cyano, nitro, -NR3R4, -NR3COR4, -CONR3R4, -SO2NR3R4, -COOR3 or -SO3R3; R1 represents the same or different radicals; hydrogen or one of the radicals R; R2 represents hydrogen or alkyl, radicals R2 being able to be the same or different when repeatedly occurring; R3 and R4, independent of one another, represent hydrogen, optionally, substituted alkyl, aryl or hetaryl, and; n represents 1 to 8.

    NAPHTHALINTETRACARBONSÄUREDERIVATE UND DEREN VERWENDUNG ALS HALBLEITER
    47.
    发明公开
    NAPHTHALINTETRACARBONSÄUREDERIVATE UND DEREN VERWENDUNG ALS HALBLEITER 有权
    萘四羧酸衍生物和它们作为SEMICONDUCTORS使用

    公开(公告)号:EP1966206A1

    公开(公告)日:2008-09-10

    申请号:EP06841589.2

    申请日:2006-12-22

    Applicant: BASF SE

    Abstract: The present invention relates to naphthalenetetracarboxylic acid derivatives of the general formula (I) in which at least one of the radicals R1, R2, R3 and R4 stands for a substituent selected from Br, F and CN, and the remaining radicals stand for hydrogen; Y1 stands for O or NRa, with Ra standing for hydrogen or an organyl radical; Y2 stands for O or NRb, with Rb standing for hydrogen or an organyl radical; Z1 and Z2 independently of one another stand for O or NRc, with Rc standing for an organyl radical; and Z3 and Z4 independently of one another stand for O or NRd, with Rd standing for an organyl radical; to a process for preparing them and to their use, more particularly as n-type semiconductors.

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