Process and apparatus for the recovery of krypton and/or xenon
    51.
    发明公开
    Process and apparatus for the recovery of krypton and/or xenon 有权
    Verfahren und Vorrichtung zur Gewinnung von Krypton und / oder Xenon

    公开(公告)号:EP1429099A1

    公开(公告)日:2004-06-16

    申请号:EP03257775.1

    申请日:2003-12-10

    IPC分类号: F25J3/04 C01B23/00

    摘要: Krypton and/or xenon is separated crudely from a mixture (100) comprising oxygen and at least one rare gas selected from the group consisting of krypton and xenon in a process comprising feeding said mixture (100) or a mixture (108) derived therefrom to a rare gas recovery system (16) and separating said mixture feed (108) in said rare gas recovery system (16) into rare gas-lean gaseous oxygen ("GOX") (110) and rare gas-enriched product (120). The process is characterised in that at least about 50 mol % of said mixture (108) is fed to the rare gas recovery system (16) in the gaseous phase and when said mixture feed (104,106) is separated by selective adsorption, the concentration of xenon in the mixture feed is no greater than 50 times the concentration of xenon in air. One advantage of a preferred embodiment of the present invention is that it can easily be retrofitted to existing pumped LOX cycle ASUs.

    摘要翻译: 从包含氧和至少一种选自氪和氙的稀有气体的混合物(100)中粗制分离氪和/或氙,包括将所述混合物(100)或由其衍生的混合物(108)加入到 稀释气体回收系统(16),并将所述稀有气体回收系统(16)中的所述混合物进料(108)分离成稀有气体贫氧气体(“GOX”)(110)和稀有气体富集产物(120)。 该方法的特征在于,将至少约50mol%的所述混合物(108)在气相中进料到稀有气体回收系统(16)中,并且当所述混合物进料(104,106)通过选择性吸附分离时,浓度 混合料中的氙气不得高于空气中氙浓度的50倍。 本发明的优选实施例的一个优点是可以容易地将其改造成现有的泵浦LOX循环ASU。

    Air separation
    55.
    发明公开
    Air separation 无效
    空气分离

    公开(公告)号:EP0722074A3

    公开(公告)日:1997-04-16

    申请号:EP95309371.3

    申请日:1995-12-21

    申请人: The BOC Group plc

    IPC分类号: F25J3/04

    摘要: Air is compressed in a compressor 2, pre-purified in an unit 4, and cooled in a heat exchanger 6. The resulting flow of air is subjected to a first rectification in a double rectification column 12 so as to separate the air into an oxygen-rich fraction and a nitrogen-rich fraction. A further oxygen fraction, enriched in argon, is withdrawn from the double rectification column 12 and is introduced into the bottom of a second rectification column 34 in which relatively pure argon is separated from the oxygen. A stream of relatively impure argon is supplied from an independent source to an intermediate region of the second rectification column 34 through an inlet 40.

    摘要翻译: 空气在压缩机2中被压缩,在单元4中被预净化,并且在热交换器6中被冷却。所产生的空气流在双精馏塔12中经受第一精馏,以便将空气分离成氧气 富含级分和富含氮的级分。 富含氩气的另一氧气馏分从双精馏塔12中排出并被引入第二精馏塔34的底部,在第二精馏塔34中从氧气中分离出相对纯的氩气。 相对不纯的氩气流从独立的源通过入口40供应到第二精馏塔34的中间区域。

    NITROGEN GAS SUPPLY SYSTEM
    56.
    发明公开
    NITROGEN GAS SUPPLY SYSTEM 失效
    GASZUFUHYSYSTEMFÜRSTICKSTOFF

    公开(公告)号:EP0750340A1

    公开(公告)日:1996-12-27

    申请号:EP96900183.3

    申请日:1996-01-08

    摘要: A nitrogen gas supply system which can efficiently supply nitrogen gas to a wafer processing unit 31 for applying a predetermined processing to wafers and to a nitrogen gas tunnel type wafer conveyor 32 for transporting the wafers to the wafer processing unit 31 through a gate valve 37 in sufficient and necessary amounts and with sufficient and necessary purity levels, respectively. This nitrogen gas supply system has a passage 38 for supplying high-purity nitrogen gas obtained in a cryogenic air separation plant 33 serving as a nitrogen gas generator to the wafer processing unit 31, a circulating passage 40 securing communication between outlet 32a and inlet 32b of the conveyor 32 via a purifier 39, and a replenishing passage 44 for replenishing nitrogen gas from a liquid nitrogen tank 36 to the circulating passage 40.

    摘要翻译: 一种氮气供给系统,其能够将氮气有效地供给到用于向晶片施加预定处理的晶圆处理单元31和氮气通道型晶片输送器32,用于通过闸阀37将晶片输送到晶片处理单元31 足够和必要的量,并具有足够和必要的纯度水平。 该氮气供给系统具有用于将作为氮气发生器的低温空气分离装置33中获得的高纯度氮气供给到晶片处理单元31的通道38,固定在晶片处理单元31的出口32a和入口32b之间的连通的循环通道40 通过净化器39的输送机32和用于将氮气从液氮罐36补充到循环通道40的补充通道44。