公开(公告)号：EP0520109A1

公开(公告)日：1992-12-30

申请号：EP91306014.1

申请日：1991-07-02

申请人： RODEL, INC.

发明人： Romberger, John A. ,  Payne, Charles C.

IPC分类号： C01B33/14 ,  C09K3/14

CPC分类号： C01B33/1485 ,  C01B33/1435 ,  C09K3/1463

摘要： A colloidal silica slurry comprising: a low metals ammonium-stabilized silica sol having the following characteristics: SiO₂ present in the range between about 15 to about 50 weight percent; a pH in the range between about 8.5 to about 11.3; a particle diameter in the range between about 4.0 to about 130 nm; aluminum, as Al, present in an amount less than about 100 ppm, based on SiO₂; iron, as Fe, present in an amount less than about 50 ppm, based on SiO₂; potassium, as K, present in an amount less than about 25 ppm, based on SiO₂; and sodium, as Na, present in an amount less than about 500 ppm, based on SiO₂; and a bactericide, a polishing rate accelerator which differs from the bactericide, and/or a sodium chlorite or sodium hypochlorite biocide. Optionally, a fungicide may also be added to the colloidal silica slurry to inhibit fungi growth.

摘要翻译： 一种胶体二氧化硅浆料，其包含：具有以下特征的低金属铵稳定化二氧化硅溶胶：存在于约15至约50重量％范围内的SiO 2; pH在约8.5至约11.3之间的范围内; 在约4.0至约130nm范围内的粒径; 铝作为Al，以SiO 2计低于约100ppm; 铁以Fe计，以SiO 2计少于约50ppm; 钾作为K，以SiO 2计，其量小于约25ppm; 钠为Na，以SiO 2计，其量小于约500ppm; 和杀菌剂，与杀菌剂不同的抛光速率促进剂，和/或亚氯酸钠或次氯酸钠杀生物剂。 任选地，还可将杀真菌剂加入到胶体二氧化硅浆料中以抑制真菌生长。

公开(公告)号：EP0239040B1

公开(公告)日：1992-03-11

申请号：EP87104173.7

申请日：1987-03-20

申请人： Rodel, Inc.

发明人： Budinger, William Doyle ,  Jensen, Elmer William

IPC分类号： B24D3/32 ,  B29C67/22

CPC分类号： B24D3/344 ,  B24D3/002 ,  B24D3/32 ,  B29C44/00 ,  B29K2105/128 ,  B29K2105/206 ,  B29L2031/736 ,  Y10T442/2033

公开(公告)号：EP0304645A3

公开(公告)日：1990-01-24

申请号：EP88111999.4

申请日：1988-07-26

申请人： Rodel, Inc.

发明人： Hoffstein, Mark F. ,  Shinagawa, Takehisa

IPC分类号： B24D3/32 ,  B24D11/00 ,  B29C67/20

CPC分类号： B24B37/24 ,  B24D3/32 ,  B29C44/321 ,  B29K2075/00 ,  B29L2031/736 ,  C08J9/0061 ,  C08J9/28 ,  C08J2375/04 ,  C08J2427/00 ,  Y02P20/582

摘要： A polishing pad material is provided with a cellular polymeric layer containing elongated cells normal to the major surfaces of the material, such that the cell openings on the polishing surface of the material comprise a majority of the surface area, and the cells have a mean diameter of about 50 to 200 microns with the diameter of the surface openings being preferably larger than the cell diameters below the surface. The cells are preferably cone-shaped and have a depth at least 1.5 times the diameter of the surface openings. The pad material is formed from a poromeric material, preferably polyurethane elastomer, with microporous cell walls having pore diameters less than 0.1 times the diameter of the cells. The polishing pad material may be made according to conventional poromeric technology, but instead of removing the usual top poromeric skin, the poromeric layer is inverted and the original bottom poromeric skin and any attached substrate are removed to open and expose the cells at a plane corresponding to their largest diameters.

公开(公告)号：EP0239040A1

公开(公告)日：1987-09-30

申请号：EP87104173.7

申请日：1987-03-20

申请人： Rodel, Inc.

发明人： Budinger, William Doyle ,  Jensen, Elmer William

IPC分类号： B24D3/32 ,  B29C67/22

CPC分类号： B24D3/344 ,  B24D3/002 ,  B24D3/32 ,  B29C44/00 ,  B29K2105/128 ,  B29K2105/206 ,  B29L2031/736 ,  Y10T442/2033

摘要： An improved polishing pad material is produced by modi­fying conventional poromeric materials in which a porous thermoplastic resin matrix, typically polyurethane, is reinforced with a fibrous network such as a felted mat of polyester fibers. The polishing material is modified by coalescing the resin among the fibers, preferably by heat treatment, to increase the porosity and hardness of the material as well increasing the surface activity of the resin. The polishing material may also incorporate polishing aids such as particulate abrasives and may also be used as a lapping or grinding material.

摘要翻译： 改进的抛光垫材料通过改变其中多孔热塑性树脂基质（通常为聚氨酯）用纤维网络例如聚酯纤维的毡毡来增强的常规的聚合物材料来制备。 通过优选通过热处理在纤维中聚结树脂来改进抛光材料，以增加材料的孔隙率和硬度，并且增加树脂的表面活性。 抛光材料还可以包括抛光助剂如微粒磨料，并且也可以用作研磨或研磨材料。

公开(公告)号：EP0197214A2

公开(公告)日：1986-10-15

申请号：EP85304348.7

申请日：1985-06-18

申请人： Rodel, Inc.

发明人： Budinger, William D. ,  Cabelli, Michael, D.

IPC分类号： B24B37/04

CPC分类号： B24B37/28

摘要： The present invention relates to a carrier assembly (10; 110) comprising a drive ring (12; 112; 212) made of a hard material in which at least one aperture (16; 116) is formed for retaining a preferably removeable workpiece holder (18, 20, 22,24,26; 118; 218) made of softer material than the material used to make the drive ring. The workpiece holder contains a cavity which holds and retains the workpiece (28, 30, 32, 34, 36; 128, 130; 228, 230). The softer material of the workpiece holder protects and cushions the workpiece while the drive ring made of hard material withstands the forces generated during polishing, lapping and grinding operations.

摘要翻译： 本发明涉及一种载体组件（10; 110），其包括由硬质材料制成的驱动环（12; 112; 212），其中形成有至少一个孔（16; 116），用于保持优选可移除的工件保持器 18,20,22,24,26; 118; 218）由比用于制造驱动环的材料更软的材料制成。 工件保持器包含保持并保持工件（28,30,32,34,36; 128,130; 228,230）的空腔。 工件保持架的较软材料可保护和缓冲工件，而由硬质材料制成的驱动环可承受抛光，研磨和研磨操作过程中产生的力。