公开(公告)号：EP1964622A1

公开(公告)日：2008-09-03

申请号：EP06811514.6

申请日：2006-10-10

申请人： BMG Co, Ltd. ,  NGK Insulators, Ltd. ,  TOHOKU UNIVERSITY

发明人： INOUE, Akihisa ,  WANG, Xin Min ,  MURAMATSU, Naokuni ,  KONDO, Yoshimasa ,  KATO, Kenji

IPC分类号： B21D22/02 ,  B21D37/00 ,  B23K26/00 ,  B41M5/26

CPC分类号： B22D23/00 ,  B23K26/0084 ,  B23K26/40 ,  B23K2201/20 ,  B23K2203/02 ,  B23K2203/04 ,  B23K2203/08 ,  B23K2203/12 ,  B23K2203/14 ,  B23K2203/172 ,  B23K2203/26 ,  B44C1/228

摘要： A challenge of the present invention is to develop a method for repeatedly forming a reverse transferred pattern in a simple and efficient manner onto the surfaces of Zr based, Ti based, Cu based, Ni based and Fe based metallic glass that have supercooled liquid temperatures of not lower than 400°C and are also required to be molded at not lower than 400°C. (a) An image pattern is converted into bitmap data being mirror reversed with respect to a real image, (b) high energy density light 15 is repeatedly flashed, and the surface of a mold 20 is scanned while one of dot holes 24 is formed by one-time irradiation, to form an image pattern as dots assembled pattern 21 onto the surface of the mold 20 in accordance with the bitmap data, and (c) the dots assembled pattern 21 is reverse-transfer molded onto a metallic glass 1 within a supercooled liquid temperature range Tg-Tx by means of the mold 20 which is for dots assembled pattern formation.

摘要翻译： 本发明的挑战是开发一种以简单有效的方式将反向转印图案反复形成在Zr基，Ti基，Cu基，Ni基和Fe基金属玻璃的表面上的方法，该基体具有过冷液体温度 不低于400℃，也要求不低于400℃。 （a）将图像图案转换为相对于实像进行镜面反转的位图数据，（b）高能量密度光15被反复闪烁，并且在形成点孔24之间扫描模具20的表面 通过一次照射，根据位图数据在模具20的表面上形成点组装图案21的图像图案，（c）将点组装图案21反向转印成型到金属玻璃1内 通过用于点组装图案形成的模具20，过冷液体温度范围Tg-Tx。