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7 条记录 (耗时 0.011 秒)

    SPUTTERING DEVICE
    3.
    发明公开
    SPUTTERING DEVICE 审中-公开

    公开(公告)号：EP4333564A1

    公开(公告)日：2024-03-06

    申请号：EP22795770.1

    申请日：2022-04-26

    申请人： EMD Corporation ,  Osaka Research Institute of Industrial Science and Technology ,  Ogawa, Soichi

    发明人： EBE, Akinori ,  KONDO, Yusuke ,  KAKEHI, Yoshiharu ,  SATOH, Kazuo ,  IKUHARA, Shiro ,  IWASAKI, Shinichi ,  OGAWA, Soichi

    IPC分类号： H05H1/46 ,  C23C14/34 ,  C23C14/35

    摘要： A sputtering apparatus (10) includes: a first target holder (111) and a second target holder (112) holding a first target (T1) and a second target (T2) respectively such that their surfaces face each other; a substrate holder (16) provided on a side of a plasma generation region (R) which is a region between the first target (T1) and the second target (T2) respectively held by the first target holder (111) and the second target holder (112); a first main magnetic field generation unit (121) and a second main magnetic field generation unit (122) respectively provided on the back surface sides of the first target holder (111) and the second target holder (112), and configured to generate a first main magnetic field and a second main magnetic field respectively on surfaces of the first target (T1) and the second target (T2) held, in which magnets are disposed such that opposite poles face each other; a power supply configured to generate an electric field in a plasma generation region (R) by applying predetermined potentials to the first target holder (111) and the second target holder (112); a radio-frequency electromagnetic field generation unit (17) configured to generate a radio-frequency electromagnetic field in the plasma generation region (R), which is provided on a side of the plasma generation region (R) facing the substrate holder (16) with the plasma generation region (R) between them; and a plasma source gas introduction unit (15) configured to introduce a plasma source gas into the plasma generation region (R), wherein means for generating a magnetic field does not exist at the ends of the first target holder (111) and the second target holder (112) on a side of radio-frequency electromagnetic field generation unit (17).

    SHOWER TUBE CLEANING DEVICE FOR FILTER FOR WATER TANK
    6.
    发明公开
    SHOWER TUBE CLEANING DEVICE FOR FILTER FOR WATER TANK 有权
    WASSERROHRREINIGUNGSVORRICHTUNGFÜRWASSERTANKFILTER

    公开(公告)号：EP2311317A1

    公开(公告)日：2011-04-20

    申请号：EP09797898.5

    申请日：2009-07-14

    申请人： Ogawa, Soichi

    发明人： OGAWA Soichi

    IPC分类号： A01K63/04 ,  B08B9/04

    CPC分类号： A01K63/045 ,  A01K63/042

    摘要： (EN) A shower tube cleaning device for a filter for a water tank, configured such that clean water from the filter is returned to the inside of the water tank through a shower tube provided with nozzles. An operating rod (11) extended in a shower tube (5) is connected to a cleaner (10) slidably provided in the shower tube (5). A scraper (12) is fixed to a free end of the operating rod (11), and the scraper (12) is pushed and pulled to make the cleaner (10) reciprocate in a sliding manner, scraping off foreign matter in the shower tube (5). The inner surface of the shower tube can be cleaned with the shower tube connected to a filter.

    摘要翻译： （EN）一种用于水箱的过滤器的淋浴管清洁装置，其构造成使得来自过滤器的清洁水通过设置有喷嘴的淋浴管返回到水箱的内部。 在淋浴管（5）中延伸的操作杆（11）连接到可滑动地设置在淋浴管（5）中的清洁器（10）。 刮刀（12）被固定到操作杆（11）的自由端，并且刮刀（12）被推动并拉动，使得清洁器（10）以滑动的方式往复运动，刮除淋浴管中的异物 （5）。 淋浴管的内表面可以用连接到过滤器的淋浴管来清洁。

    CLEANING DEVICE FOR CLEANING INSIDE OF WATER TANK
    7.
    发明公开
    CLEANING DEVICE FOR CLEANING INSIDE OF WATER TANK 有权
    清洗装置用于清洗水箱内部

    公开(公告)号：EP2301331A1

    公开(公告)日：2011-03-30

    申请号：EP09804849.9

    申请日：2009-07-14

    申请人： Ogawa, Soichi

    发明人： OGAWA Soichi ,  YOSHIDA Yutaka

    IPC分类号： A01K63/04 ,  F04F10/00

    CPC分类号： F04F10/00 ,  A01K63/10 ,  Y10T137/2713 ,  Y10T137/2747 ,  Y10T137/2829 ,  Y10T137/2883 ,  Y10T137/86019 ,  Y10T137/86099

    摘要： A cleaner for the inside of a water tank utilizing a siphoning action is provided, in which the interior of a water passage (24) between an upstream-side one-way valve (Vu) and a downstream-side one-way valve (Vd) is pressurized or depressurized by a pressing operation of a suction operation tool (A) provided in a bent connecting part between a main body portion (1) and a grip portion (2) of a suction pipe (P), and water-tank water of the main body portion (1) is sucked into the suction pipe (P). This enables waste material such as leftover food within water-tank water to be sucked up together with dirty water by a very simple operation.