IMPROVED ALUMINA LAYER DEPOSITED AT LOW TEMPERATURE

    公开(公告)号:EP3848484A3

    公开(公告)日:2021-09-15

    申请号:EP20020015.2

    申请日:2020-01-10

    申请人: Ruppi, Sakari

    发明人: Ruppi, Sakari

    摘要: The present invention relates to a coated cutting tool consisting of a substrate of cemented carbide, cermet, ceramics, steel or a superhard material such as cubic boron nitride (CBN) at least partially coated with a coating consisting of at least one outer layer of 2 to 10 µm, preferably 3 to 6 µm, thick α-Al 2 O 3 layer deposited by chemical vapour deposition (CVD) on an inner layer of 0.5-20 µm thick, preferably 4 to 8.5 µm thick Ti 1-x Al x N, Ti 1-x Al x CN or TaC 1-x N x or combinations thereof wherein the said α-Al 2 O 3 exhibits an X-ray diffraction pattern, as measured using CuK α radiation and theta-2theta scan, and texture coefficients TC(hkl) being determined according to Harris formula with one dominant texture coefficient 4 2 S/CO 2 ratio. The α-Al 2 O 3 layer is deposited in a temperature range of 600-800 °C being particularly useful in facilitating deposition of α-Al 2 O 3 layers on metastable materials like cubic Ti 1-x Al x N. The deposition process is characterized by improved texture-control and by relatively very high growth rates.

    IMPROVED ALPHA ALUMINA LAYER DEPOSITED WITH CONTROLLED TEXTURES

    公开(公告)号:EP3848485A1

    公开(公告)日:2021-07-14

    申请号:EP20020016.0

    申请日:2020-01-10

    申请人: Ruppi, Sakari

    发明人: Ruppi, Sakari

    摘要: The present invention relates to a coated cutting tool consisting of a substrate of cemented carbide, cermet, ceramics, steel or a superhard material such as cubic boron nitride (CBN) at least partially coated with a coating consisting of at least one outer layer of 5 to 35 µm, thick α-Al 2 O 3 layer deposited by chemical vapour deposition (CVD) on an inner layer of 2-25 µm thick Ti(C,N) or TaC 1-x N x or combinations thereof wherein the said α-Al 2 O 3 exhibits an X-ray diffraction pattern, as measured using CuK α radiation and theta-2theta scan, and texture coefficients TC(hkl) being determined according to Harris formula with one dominant texture coefficient 4,5 2 S/CO 2 ratio. The alumina layer is characterized by improved textures and by high growth rates together with improved wear resistance and toughness.

    IMPROVED ALUMINA LAYER DEPOSITED AT LOW TEMPERATURE

    公开(公告)号:EP3848484A2

    公开(公告)日:2021-07-14

    申请号:EP20020015.2

    申请日:2020-01-10

    申请人: Ruppi, Sakari

    发明人: Ruppi, Sakari

    摘要: The present invention relates to a coated cutting tool consisting of a substrate of cemented carbide, cermet, ceramics, steel or a superhard material such as cubic boron nitride (CBN) at least partially coated with a coating consisting of at least one outer layer of 2 to 10 µm, preferably 3 to 6 µm, thick α-Al 2 O 3 layer deposited by chemical vapour deposition (CVD) on an inner layer of 0.5-20 µm thick, preferably 4 to 8.5 µm thick Ti 1-x Al x N, Ti 1-x Al x CN or TaC 1-x N x or combinations thereof wherein the said α-Al 2 O 3 exhibits an X-ray diffraction pattern, as measured using CuK α radiation and theta-2theta scan, and texture coefficients TC(hkl) being determined according to Harris formula with one dominant texture coefficient 4 2 S/CO 2 ratio. The α-Al 2 O 3 layer is deposited in a temperature range of 600-800 °C being particularly useful in facilitating deposition of α-Al 2 O 3 layers on metastable materials like cubic Ti 1-x Al x N. The deposition process is characterized by improved texture-control and by relatively very high growth rates.