公开(公告)号：EP3904858A1

公开(公告)日：2021-11-03

申请号：EP19903278.0

申请日：2019-12-26

申请人： Sanyu Electron Co., Ltd. ,  Keio University

发明人： SHIBATA, Shinsuke ,  SHINDO, Tomoko ,  OKANO, Hideyuki ,  GOTO, Shuichi

IPC分类号： G01N1/28

摘要： Sample preparation system and method which enable electron microscope observation of a sample slice with simple structure and process are provided. The sample preparation system includes at least one of a plasma treatment apparatus and a sputtering apparatus, as well as a slice collecting apparatus. The plasma treatment apparatus is configured to feed a resin tape in a plasma irradiation area to irradiate the resin tape with plasma, thereby continuously hydrophilizing the resin tape. The sputtering apparatus is configured to feed the resin tape in a sputtering area to continuously perform sputtering on the resin tape, thereby imparting conductivity to the resin tape. The slice collecting apparatus is configured to serially collect slices cut out from a sample onto the resin tape having been subjected to plasma treatment or sputtering.