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1.发明授权VERFAHREN ZUR MASKENINSPEKTION IM RAHMEN DES MASKENDESIGNS UND DER MASKENHERSTELLUNG 有权方法掩模检查的面罩设计下方和掩模制造
公开(公告)号：EP1875307B1
公开(公告)日：2009-08-05
申请号：EP06706655.5
申请日：2006-02-04
申请人： Carl Zeiss SMS GmbH , Synopsys GmbH
CPC分类号： G03F1/84 , G03F7/7065 , G03F7/70666
摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.
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2.发明公开VERFAHREN ZUR MASKENINSPEKTION IM RAHMEN DES MASKENDESIGNS UND DER MASKENHERSTELLUNG 有权方法掩模检查的面罩设计下方和掩模制造
公开(公告)号：EP1875307A1
公开(公告)日：2008-01-09
申请号：EP06706655.5
申请日：2006-02-04
申请人： Carl Zeiss SMS GmbH , Synopsys GmbH
CPC分类号： G03F1/84 , G03F7/7065 , G03F7/70666
摘要： The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.
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