公开(公告)号：EP1908112A2

公开(公告)日：2008-04-09

申请号：EP06787185.5

申请日：2006-07-14

申请人： The University of Jordan ,  King Abdulaziz city for Science and Technology ,  THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS

发明人： NAYFEH, Munir, H. ,  ABUHASSAN, Laila ,  NIELSEN, David ,  ALMUHANNA, Addulrahman

IPC分类号： H01L29/24

CPC分类号： C01B33/021 ,  B82Y30/00

摘要： The invention provides a silicon nanoparticle formation method that can rapidly produce substantial quantities of silicon nanoparticles, which are readily recoverable for subsequent uses. A preferred method includes treating a silicon substrate with hexachloroplatinic acid and etching the silicon substrate with HF/H
2 O
2 to form silicon nanoparticles on the surface of the silicon. Preferred methods of the invention use a cathodization of silicon source material in hexachloroplatinic acid/HF/H
2 O
2 to form Si nanoparticles. Other embodiments use a currentless immersion of silicon material in hexachloroplatinic acid followed by etching. In preferred embodiments of the invention, the silicon source material is a silicon substrate, e.g., a silicon wafer.